Catadioptric Projection  Objective With Intermediate Images

ABSTRACT

A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.

This application is a Continuation of U.S. Application No. 14/079,026,filed on Nov. 13, 2013, which is a Continuation of U.S. application Ser.No. 13/361,707, filed on Jan. 30, 2012, which is a Continuation of U.S.application Ser. No. 11/596,868, filed on Oct. 6, 2008, now U.S. Pat.No. 8,107,162, issued on Jan. 31, 2012, which was the National Stage ofInternational Application No. PCT/EP2005/005250, filed on May 13, 2005,which claims the benefit of U.S. Provisional Application No. 60/571,533filed on May 17, 2004. All of these prior applications are herebyincorporated into the present application in their entireties byreference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The invention relates to a catadioptric projection objective for imagingof a pattern, which is arranged on the object plane of the projectionobjective, on the image plane of the projection objective.

2. Description of the Related Art

Projection objectives such as these are used in microlithographyprojection exposure systems for the production of semiconductorcomponents and other finely structured components. They are used toproject patterns of photomasks or reticles which are referred to in thefollowing text in a general form as masks or reticles, onto an objectwhich is coated with a light-sensitive layer, with very high resolutionand on a reduced scale.

In this case, in order to produce ever finer structures, it is necessaryon the one hand to enlarge the image-side numerical aperture (NA) of theprojection objective, and on the other hand to use ever shorterwavelengths, preferably ultraviolet light at wavelengths of less thanabout 260 nm, for example 248 nm, 193 nm or 157 nm.

In the past, purely refractive projection objectives have beenpredominantly used for optical lithography. These are distinguished by amechanically relatively simple, centered design, which has only a singleoptical axis, that is not folded. Furthermore, it is possible to useobject fields which are centered with respect to the optical axis, whichminimize the light transmission level to be corrected, and simplifyadjustment of the objective.

However, the form of the refractive design is primarily characterized bytwo elementary imaging errors: the chromatic correction and thecorrection for the Petzval sum (image field curvature).

Catadioptric designs, which have at least one catadioptric objectivepart and a hollow mirror or a concave mirror, are used to simplify thecorrection for the Petzval condition and to provide a capability forchromatic correction. In this case, the Petzval correction is achievedby the curvature of the concave mirror and negative lenses in itsvicinity, while the chromatic correction is achieved by the refractivepower of the negative lenses upstream of the concave mirror (for CHL) aswell as the diaphragm position with respect to the concave mirror (CHV).

One disadvantage of catadioptric designs with beam splitting is,however, that it is necessary to work either with off-axis objectfields, that is to say with an increased light conductance value (insystems using geometric beam splitting) or with physical beam splitterelements, which generally cause polarization problems. The term “lightconductance value” as used here refers to the Lagrange optical invariantor Etendue, which is defined here as the product of the image fielddiameter and the image-side numerical aperture.

In the case of off-axis catadioptric systems, that is to say in the caseof systems with geometric beam splitting, the requirements for theoptical design can be formulated as follows: (1) reduce the lighttransmission level to the maximum extent, (2) design the geometry of thefoldings (beam deflections) such that a mounting technology can bedeveloped for this purpose, and (3) provide effective correction, inparticular the capability to correct the Petzval sum and the chromaticaberrations jointly in the catadioptric mirror group.

In order to keep the geometric light conductance value (Etendue) low,the folding of the design should in principle take place in the regionof low NA, that is to say for example close to the object, or in thevicinity of a real intermediate image.

However, as the numeric aperture increases, the object-side numericalaperture also increases, and thus the distance between the first foldingmirror and the reticle, so that the light transmission level rises.Furthermore, the diameter of the hollow mirror and the size of thefolding mirror increase. This can lead to physical installation spaceproblems.

These can be overcome by first of all imaging the reticle by means of afirst relay system onto an intermediate image, and by carrying out thefirst folding in the area of the intermediate image. A catadioptricsystem such as this is disclosed in EP 1 191 378 A1. This has arefractive relay system, followed by a catadioptric objective part witha concave mirror. The light falls from the object plane onto a foldingmirror (deflection mirror) which is located in the vicinity of the firstintermediate image, from there to the concave mirror and from there ontoa refractive object part, with a second real intermediate image beinggenerated in the vicinity of a second deflection mirror, and therefractive object part images the second intermediate image on the imageplane (wafer). Concatenated systems having, in that sequence, arefractive (R), a catadioptric (C), and a refractive (R) imagingsubsystem will be denoted “R-C-R” type systems in the following.

Systems of type R-C-R with a similar folding geometry are disclosed inWO 2004/019128 A, WO 03/036361 A1 and US 2002/019946 A1. Patentapplication US 2004/0233405 A1 discloses R-C-R type projectionobjectives with different folding geometries including objectives wherethe first folding mirror is arranged optically downstream of the concavemirror to deflect radiation coming from the concave mirror towards theimage plane.

Other catadioptric systems with two real intermediate images aredisclosed in JP 2002-372668 and in U.S. Pat. No. 5,636,066. WO 02/082159A1 and WO 01/04682 disclose other catadioptric systems with more thanone intermediate image.

SUMMARY OF THE INVENTION

It is one object of the invention to provide a catadioptric projectionobjective which allows very high resolutions to be achieved, with acompact design with optimized dimensions. It is another object to allowcorrection of the Petzval sum and of the chromatic aberrations with goodmanufacturing conditions.

As a solution to these and other objects this invention, according toone formulation, provides a catadioptric projection objective forimaging of a pattern, which is arranged on the object plane of theprojection objective, on the image plane of the projection objective,having: a first objective part for imaging of an object field to form afirst real intermediate image; a second objective part for generating asecond real intermediate image using the radiation coming from the firstobjective part; and a third objective part for imaging the second realintermediate image on the image plane; wherein the second objective partis a catadioptric objective part with a concave mirror; a first foldingmirror for deflecting the radiation coming from the object plane in thedirection of the concave mirror and a second folding mirror fordeflecting the radiation coming from the concave mirror in the directionof the image plane are provided; and a field lens with a positiverefractive power is arranged between the first intermediate image andthe concave mirror, in a region close to the field of the firstintermediate image.

According to another formulation, a field lens with a positiverefractive power is arranged geometrically between the first foldingmirror and the concave mirror in a region close to the field of thefirst intermediate image. This position is optically between the firstintermediate image and the concave mirror if the first intermediateimage is created optically upstream, i.e. before the field lens in lightpropagation direction. The first intermediate image may also bepositioned optically downstream, i.e. behind the field lens, or maypartly extend into the field lens.

The enlargement of the numerical aperture which is required in order toachieve very high resolutions frequently leads in conventional systemsto a major increase in the diameter of the optical components which arelocated in the area of preferred diaphragm positions. The inventioncounteracts this effect.

The expression “field lens” describes an individual lens or a lens groupwith at least two individual lenses. The expression takes account of thefact that the function of a lens can fundamentally also be carried outby two or more lenses (splitting of lenses). The refractive power ofthis field lens is arranged close to the field, that is to say in theoptical vicinity of a field plane. This area close to the field for afield plane is distinguished in particular by the chief ray height ofthe imaging being large in comparison to the marginal ray height. Inthis case, the marginal ray height is the ray height of a marginal raywhich leads from the innermost point of the object field, which isclosest to the optical axis, to an edge of an aperture diaphragm, whilethe chief ray (principal ray) leads from the outermost field point ofthe object field parallel to, or at an acute angle to, the optical axisand intersects the optical axis in the area of the system diaphragm,that is to say at a diaphragm location which is suitable for the fittingof an aperture diaphragm. The ratio between the marginal ray height andthe chief ray height is thus less than unity in the area close to thefield.

The expression “intermediate image” describes the area between aparaxial intermediate image and an marginal ray intermediate image.Depending on the correction state of the intermediate image, this areamay extend over a certain axial range in which case, by way of example,the paraxial intermediate image may be located in the light pathupstream or downstream of the marginal ray intermediate image, dependingon the spherical aberration (undercorreaction or overcorrection). Theparaxial intermediate image and the marginal ray intermediate image mayalso essentially coincide. For the purposes of this application, anoptical element A, for example a field lens, is located “between” anintermediate image and another optical element B when at least a portionof the optical element A is located between the (generally axiallyextended) intermediate image and the optical element B. The intermediateimage may thus also partially extend beyond an optical surface which,for example, may be advantageous for correction purposes. Theintermediate image is frequently located completely outside opticalelements. Since the radiation energy density in the intermediate imagearea is particularly high, this may be advantageous, for example, withrespect to the radiation load on the optical elements.

Positive refractive power in the divergent beam path between an upstreamintermediate image and the concave mirror contributes to the capabilityfor the downstream lenses in the beam path and the concave mirror tohave small diameters. This applies in particular to the at least onenegative lens which is provided in preferred embodiments in theimmediate vicinity upstream of the concave mirror and which, inconjunction with the concave mirror, makes a major contribution to thecorrection of the chromatic longitudinal aberration CHL. If thechromatic longitudinal aberration is corrected in some other way, thereis no need for this negative lens.

The insertion of positive refractive power between a field planeupstream of the concave mirror and the concave mirror leads in its ownright to a contribution to the image field curvature which isproportional to the strength of the positive refractive power. In orderto at least partially compensate for this effect, the concave mirrorshould have greater curvature than in the absence of the positiverefractive power. In order, on the other hand, to keep the aberrationswhich are introduced by the reflection on the concave mirror as small aspossible, it is advantageous for the radiation which strikes the concavemirror to strike it essentially at right angles. When positiverefractive power is inserted downstream from the intermediate image,this leads to an increase in the negative refractive power directlyupstream of the concave mirror, in order to ensure largely perpendicularradiation incidence by virtue of the scattering effect. The increase inthe negative refractive power upstream of the concave mirror can atleast partially compensate for the reduction in the CHL correction byreducing the size of the lens diameter in this area, so that good CHLcorrelation is ensured even with a relatively small mirror diameter.

In preferred embodiments, the first intermediate image is located in thevicinity of a folding mirror, which makes it possible to keep theEtendue of the system small. The field lens can generally be fitted veryclose to the intermediate image without being adversely affected by thefolding mirror, thus allowing effective correction of imaging errors. Inparticular, the objective parts can be suitably designed in order toensure that at least the intermediate image which is close to the fieldlens is subject to severe aberration. This allows particularly effectivecorrection of imaging errors. The effectiveness of the correction can beassisted by designing at least that lens surface of the field lens whichfaces the intermediate image as an aspherical surface.

In one embodiment, the field lens is arranged geometrically between theconcave mirror and at least one folding mirror in a region through whichthe beam passes twice, in such a manner that a first lens area of thefield lens is arranged in the beam path between the object plane and theconcave mirror, and a second lens area of the field lens is arranged inthe beam path between the concave mirror and the image plane.

The field lens can be arranged such that it is arranged not only in theoptical vicinity of an intermediate image plane which is located in thebeam path upstream of the concave mirror, but also in the opticalvicinity of an intermediate image plane which is located in the beampath downstream from the concave mirror. This results in an arrangementclose to the field with respect to two successive field planes, so thata powerful correction effect can be achieved at two points in the beampath.

At least one multiple area lens can be arranged in a region of theprojection objective through which the beam passes twice and has a firstlens area, through which the beam passes in a first direction, and asecond lens area, through which the beam passes in a second direction,with the first lens area and the second lens area not overlapping oneanother, at least on one side of the lens. This multiple area lens maybe used as a field lens. If the footprints of the beam paths do notoverlap on at least one of the two lens faces, a multiple area lens suchas this allows two lenses which act independently of one another to begeometrically moved to a common point. It is also possible to physicallymanufacture two lenses which act independently of one another as onelens, specifically as an integral multiple area lens, from one lensblank. A multiple area lens such as this can be clearly distinguishedfrom a conventional lens through which the beam passes twice since, inthe case of a multiple area lens of this type its optical effect on thebeams which pass through it independently of one another can beinfluenced by suitable independent shaping of the refractive surfaces ofthe lens areas independently of one another. Alternatively, a lensarrangement with one or two half-lenses or lens elements can also bearranged at the location of an integral multiple area lens in order toinfluence the beams as they pass one another, independently of oneanother.

Projection objectives with geometric beam splitting, an intermediateimage and a multiple area lens have been disclosed, for example, in WO03/052462 A1 from the same applicant. The disclosure in this patentapplication is included by reference in the content of this description.

The projection objective preferably has an image-side numerical apertureof NA>0.85, and an image-side working distance of A≦10 mm. Projectionobjectives such as these may be used, if required, or immersionlithography with NA>1. The image-side working distance or the workingdistance in the image area is the (shortest) axial distance between theexit surface of the objective and the image plane. This working distancein the image area, which is filled with a gas during operation in drysystems, is filled with an immersion medium during operation inimmersion systems, with the immersion medium having a refractive indexwhich is relatively high in comparison to that of gas.

It is generally advantageous for the image-side working distance not tofall below a minimum value. In this case, it should be noted thatscratches, dirt and inhomogeneities on or in the last optical elementcan lead to a disturbance of the image if the working distance is tooshort. A finite working distance of, for example, 1 mm or more can incontrast lead to relatively large sub-apertures (footprints of onespecific field point) with the high image-side numerical apertures, sothat an averaging effect can occur and any image disturbance is reducedor suppressed.

Particular criteria must be taken into account for the definition of theworking distance in the image area in immersion systems. On the onehand, a long working distance results not only in greater radiationlosses owing to the normally lower transmission of immersion liquids (incomparison to gases) but also to a greater amount of aberration of thesurfaces which are located in the vicinity of the image plane,specifically for spherical aberration. On the other hand, the image-sideworking distance should be sufficiently large to allow laminar flow ofan immersion fluid. It may also be necessary to provide space formeasurement purposes and sensors. In preferred embodiments, theimage-side working distance is between about 1 mm and about 8 mm, inparticular between about 1.5 mm and about 5 mm. When using an immersionfluid between the exit surface and the image plane, preferredembodiments have an image-side numerical aperture of NA≧0.98, with theimage-side numerical aperture preferably being at least NA=1.0, or atleast NA=1.1. The projection objective is preferably matched to animmersion medium which has a refractive index of n_(I)>1.3 at anoperating wavelength.

Very pure water for which n_(I)≈1.43 is suitable as an immersion mediumfor an operating wavelength of 193 nm. The article “ImmersionLithography at 157 nm by M. Switkes and M. Rothschild, J. Vac. Sci.Technol. B 19(6), November/December 2001, pages 1 et seq proposesimmersion liquids based on perfluoropolyethers (PFPE) which aresufficiently transparent for an operating wavelength of 157 nm and arecompatible with a number of photoresist materials that are currentlyused in microlithography. One tested immersion liquid has a refractiveindex of n_(I)=1.37 at 157 nm.

The optical design also allows use for non-contacting near-fieldprojection lithography. In this case, sufficient light energy can beinjected into the substrate to be exposed via a gap which is filled withgas, provided that a sufficiently short image-side working distance ismaintained, averaged over time. This should be less than four times theoperating wavelength that is used, in particular less than the operatingwavelength. It is particularly advantageous for the working distance tobe less than half the operating wavelength, for example less than onethird, one quarter or one fifth of the operating wavelength. These shortworking distances allow imaging in the optical near field in whichevanescent fields, which exist in the immediate vicinity of the lastoptical surface of the imaging system, are used for imaging.

The invention thus also covers a non-contacting projection exposuremethod in which evanescent fields of the exposure light which arelocated in the immediate vicinity of the exit surface can be used forthe lithographic process. In this case, if the working distances aresufficiently short (finite), a light component which can be used forlithography can be emitted from the exit surface of the objective, andcan be injected into an entry surface, which is immediately adjacent ata distance, despite geometrical total internal reflection conditions onthe last optical surface of the projection objective.

Embodiments for non-contacting near-field projection lithographypreferably use typical working distances in the region of the operatingwavelength or less, for example between about 3 nm and about 200 nm, inparticular between about 5 nm and about 100 nm. The working distanceshould be matched to the other characteristics of the projection system(characteristics of the projection objective close to the exit surface,characteristics of the substrate close to the entry surface) so as toachieve an input efficiency of at least 10%, averaged over time.

A method for production of semiconductor components and the like is thuspossible within the scope of the invention, in which a finite workingdistance is set between an exit surface for exposure light which isassociated with the projection objective and an entry surface forexposure light which is associated with the substrate, with the workingdistance within an exposure time interval being set, at least at times,to a value which is less than a maximum extent of an optical near fieldof the light emerging from the exit surface.

Use as a dry objective is also possible, if required, with minormodifications. Dry objectives are designed such that a gap which isfilled with gas is produced during operation between the exit surface ofthe projection objective and the entry surface of an object to beexposed, for example a wafer, with this gap width typically beingconsiderably greater than the operating wavelength. The achievablenumerical apertures with systems such as these are restricted to valuesNA<1, since total internal reflection conditions occur on the exitsurface on approaching the value NA=1, preventing any exposure lightfrom being emitted from the exit surface. In preferred embodiments ofdry systems, the image-side numerical aperture is NA≧0.85 or NA≧0.9.

The third objective part immediately upstream of the image plane ispreferably designed to be purely refractive, and can be optimized inorder to produce high image-side numerical apertures (NA). It preferablyhas a first lens group, which follows the second intermediate image, andhas a positive refractive power, a second lens group, which immediatelyfollows the first lens group and has a negative refractive power, athird lens group which immediately follows the second lens group and hasa positive refractive power, a fourth lens group which immediatelyfollows the third lens group and has a positive refractive power, and apupil surface which is arranged in a transitional region from the thirdlens group to the fourth lens group and in whose vicinity a systemdiaphragm can be arranged. The third lens group preferably has an entrysurface which is located in the vicinity of a point of inflection of amarginal ray height between the second lens group and the third lensgroup, with no negative lens with any substantial refractive power beingarranged between this entry surface and the system diaphragm. There arepreferably only positive lenses between this entry surface and the imageplane. This allows a material-saving design, with moderate lensdiameters.

The last optical element in the projection objective immediatelyupstream of the image plane is preferably a plano-convex lens with ahigh spherical or aspherically curved entry surface and an exit surfacewhich is essentially planar. This may be in the form of a plano-convexlens which is virtually hemispherical or is not hemispherical. The lastoptical element, in particular the plano-convex lens, may also becomposed of calcium fluoride in order to avoid problems resulting fromradiation-induced density changes (in particular compaction).

The first objective part may be used as a relay system in order toproduce a first intermediate image, with a predetermined correctionstate at a suitable position, from the radiation coming from the objectplane. The first objective part is generally purely refractive. In someembodiments, at least one folding mirror is provided in this firstobjective part, which images the object plane to form a firstintermediate image, such that the optical axis is folded at least once,and preferably no more than once, within the objective part which isclosest to the object.

In some embodiments, the first objective path is a catadioptricobjective part with a concave mirror and an associated folding mirror,which may be used as the first folding mirror for the overall projectionobjective.

The provision of at least two catadioptric subsystems has majoradvantages. In order to identify significant disadvantages of systemswith only one catadioptric subsystem, it is necessary to consider howthe Petzval sum and the chromatic aberrations are corrected in acatadioptric part. The contribution of a lens to the chromaticlongitudinal aberration CHL is proportional to the square of themarginal ray height h, to the refractive power φ of the lens, and to thedispersion ν of the material. On the other hand, the contribution of asurface to the Petzval sum depends only on the surface curvature and ofthe sudden change in the refractive index (which is −2 in the case of amirror in air).

In order to allow the contribution of the catadioptric group to thechromatic correaction to become large, large marginal ray heights (thatis to say large diameters) are thus required, and large curvatures arerequired in order to allow the contribution to the Petzval correction tobecome large (that is to say small radii, which are best achieved withsmall diameters). These two requirements are contradictory.

The contradictory requirements based on Petzval correction (that is tosay correaction of the image field curvature) and chromatic correctioncan be solved by introduction of (at least) one further catadioptricpart into the system. Since the first catadioptric objective part can bedesigned such that both the image field curvature and the chromaticlongitudinal aberration can be largely or completely corrected, thefirst intermediate image may have a defined correction state withrespect to these aberrations, so that the subsequent objective parts mayhave an advantageous design.

In one embodiment, the first objective part is a catadioptric objectivepart with a physical beam splitter, which has a polarization-selectivebeam splitter surface which is used as a folding mirror and at the sametime separates that radiation which leads to the concave mirror of thefirst objective part from that radiation which is reflected by thisconcave mirror.

In some embodiments, a concave mirror is provided which is designed asan active mirror, so that the shape of the concave mirror surface can bevaried by a suitable drive. This can be used to compensate for variousimaging errors.

Some embodiments of projection objectives according to the inventionhave a crossed beam path at at least one point. For this purpose, theyare designed such that a first beam section which runs from the objectplane to a concave mirror and a second beam section which runs from theconcave mirror to the image plane can be produced, and one foldingmirror is arranged with respect to the concave mirror in such a mannerthat one of the beam sections is folded on the folding mirror, and theother beam section passes through the folding mirror without anyvignetting, and the first beam section and the second beam section crossover in a crossing region.

The crossed beam path in the region of a catadioptric objective part,allows projection objectives with a compact and mechanically robustarrangement of the optical components. In this case, a beam path withoutany vignetting can be achieved, so that no folding mirror intersects abeam which is either reflected on the folding mirror or is passed by thefolding mirror without reflection. In this way, only the systemdiaphragm limits the angular distribution of the rays which contributeto imaging, in an axially symmetrical manner. At the same time, evenwith the largest numerical apertures, which are associated with largemaximum beam diameters and, possibly, highly convergent or divergentbeams in the region of the field planes, it is possible to achieve amoderate size for the overall field to be corrected. In this case, theexpression “overall field” describes the field area which is enclosed bya minimum circle around the generally rectangular field. The size of theoverall field to be corrected increases with the field size and thelateral offset of an axially asymmetric field with respect to theoptical axis, and should be minimized in order to simplify thecorrection process.

Catadioptric projection objectives with a crossed beam path aredisclosed, for example, in the U.S. provisional application with theSer. No. 60/511,673, which was filed on Oct. 17, 2003, or the U.S.patent application with the Ser. No. 10/734,623, which was filed on Dec.27, 2003, or the U.S. provisional application with the Ser. No.60/530,622, which was filed on Dec. 19, 2003, by the same applicant. Thedisclosure content of these patent applications is included by referencein the content of this description.

In preferred embodiments, an off-axis effective object field arranged inthe object surface of the projection objective is imaged onto anoff-axis effective image field arranged in the image surface of theprojection objective. Here, the term “effective object field” relates tothe object field which can be effectively imaged by the projectionobjective without vignetting at a given numerical aperture. The amountof a lateral offset between the effective object field and the firstpart of the optical axis defined by the first objective part may becharacterized by a finite object center height h. Likewise, on the imageside of the projection objective, the effective image field is laterallyoffset with respect to the image side part of the optical axis by afinite image center height h′ related to the object center height h bythe magnification ratio β of the projection objective according toh′=|β·h|. In some conventional projection objectives having a refractivefirst objective part, a catadioptric second objective part, and arefractive third objective part (also denoted type R-C-R) efforts havebeen made to align the parts of the optical axis defined by the objectside refractive objective part and the image side refractive objectivepart such that no lateral axis offset exists between these parts of theoptical axis. However, under these conditions, a finite value of anobject-image-shift (OIS) defined between an object field center and animage field center results. Where the object surface and the imagesurface of the projection objective are parallel to each other, theobject-image-shift may be defined as a lateral offset between an objectfield center axis running parallel to the object side optical axisthrough the center of the effective object field and an image fieldcenter axis running parallel to the image side part of the optical axisthrough the center of the effective image field. It has been found thatsmall values of object-image-shift may be desirable e.g. if theprojection objective is to be incorporated into a projection exposuresystem designed for scanning operations. Also, measuring techniques usedfor the qualification of the projection objective may be simplified withrespect to conventional measuring techniques if small amounts ofobject-image-shift are obtained. Therefore, in preferred embodiments,the following condition holds:

0≦OIS<|h·(1−|β|)|.

In embodiments obeying this condition, the object-image-shift OIS issmaller than the object-image-shift of designs where the object sidepart of the optical axis and the image side part of the optical axis arecoaxial. In preferred embodiments, no object-image-shift is present suchthat the condition OIS=0 is fulfilled.

These conditions may be useful in embodiments of the invention having afield lens with positive refractive power arranged between the firstintermediate image and the concave mirror in the optical vicinity of thefirst intermediate image. However, small values for OIS may also beuseful for conventional designs having no field lens of this type, suchas shown e.g. in WO 2004/019128 A.

Another aspect of the invention enables designing projection objectiveshaving potential for very high image side numerical apertures NA>1.2 orNA>1.3 while at the same time the overall track length (axial distancebetween object surface and image surface) can be limited to valuesallowing incorporation of the projection objective in conventionalprojection exposure systems and, at the same time, allowing to limit themaximum size (diameter) of lenses in the refractive objective partsupstream and/or downstream of a folding mirror. To this end, inpreferred embodiments, a refractive power and a position of the fieldlens is set such that for a first chief ray direction cosine CRA₁ at thefirst intermediate image the following condition holds:

|CRA1|<|β₁*(Y _(OB))/(L _(HOA))|

where β₁ denotes the magnification of the first objective part, Y_(OB)is the object height of the outermost field point for which the chiefray is considered and L_(HOA) is the geometrical distance from the firstintermediate image to the concave mirror (length of the horizontalaxis). With other words, it may be desirable that the chief ray istelecentric or almost telecentric at a an intermediate image. A chiefray obeying the condition given above will be denoted as an “essentiallytelecentric chief ray” in the following. Providing an essentiallytelecentric chief ray at a folding mirror close to such intermediateimage allows to limit the size of lenses immediately upstream and/ordownstream of the folding mirror. In addition, it has been found thatinstallation space within the third objective part responsible forproviding high image side numerical apertures is obtained.

Further, in some embodiments it has been found beneficial for obtainingvery high image side numerical apertures if a first axial length AL1 ofthe first objective part is smaller than a third axial length AL3 of thethird objective part, wherein the axial length AL1 is measured betweenthe object plane and an intersection of the optical axis with the firstfolding mirror and the axial length AL3 is measured between theintersection of the optical axis with the second folding mirror and theimage plane. In preferred embodiments, the condition AL1/AL3<0.9, morepreferably AL1/AL3<0.8 holds

Systems according to the invention can preferably be used in the deep UVband, for example at 248 nm, 193 nm or 157 nm, or less.

These features and further features are evident not only from the claimsbut also from the description and the drawings, in which case theindividual features can be implemented in their own right or together inthe form of subcombinations of embodiments of the invention, and inother fields, and can represent advantageous embodiments, as well asembodiments which are worthy of protection in their own right.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows a schematic illustration of a projection exposure systemfor immersion lithography with one embodiment of a catadioptricprojection objective according to the invention;

FIG. 2 shows a schematic illustration of the design of preferredembodiments of projection objectives according to the invention, with arefractive first objective part, a catadioptric second objective part,and a refractive third objective part;

FIG. 3 shows a lens section through a first embodiment of a projectionobjective according to the invention;

FIG. 4 shows a lens section through a second embodiment of a projectionobjective according to the invention;

FIG. 5 shows a schematic illustration of the design of one embodiment ofa projection objective according to the invention, with a differentfolding geometry and a crossed beam path;

FIG. 6 shows a schematic illustration of one embodiment of a projectionobjective according to the invention, with a catadioptric firstobjective part, a catadioptric second objective part and a refractivethird objective part;

FIG. 7 shows a lens section for one embodiment of a catadioptric firstobjective part with a physical beam splitter, which can be used for thedesign shown in FIG. 6;

FIGS. 8 a-8 e show various mirror arrangements for folding mirrors forprojection objectives according to the invention;

FIG. 9 shows a lens section for an embodiment having coaxial first andthird objective parts;

FIG. 10 shows a lens section for another embodiment having coaxial firstand third objective parts;

FIGS. 11 a-11 b: FIG. 11 a shows a lens section through an embodimenthaving laterally offset first and third objective parts such that thereis no object-image-shift (OIS), whereas FIG. 11 b illustrates theconditions therefore;

FIG. 12 shows a lens section through a reference system having no fieldlens;

FIG. 13 shows a lens section through an embodiment having an essentiallytelecentric chief ray at the folding mirrors;

FIGS. 14 a-14 b: FIG. 14 a shows a schematic drawing illustrating thetrajectories of the chief ray in a conventional system; FIG. 14 b showsa schematic drawing illustrating the trajectories of the chief rayaccording to embodiments having an essentially telecentric chief ray atthe folding mirrors;

FIG. 15 shows a lens section through another embodiment havingessentially telecentric chief rays at the folding mirrors and a fieldlens geometrically close to the folding mirrors, where the field lens isoptically situated both in the first objective part and in the thirdobjective part;

FIG. 16 shows a lens section of an embodiment having a field lensfurther apart from the folding mirrors optically within thecatadioptric, second objective part and having NA=1.30; and

FIG. 17 shows a variant of the projection objective of FIG. 16 havingNA=1.35.

In the following description of preferred embodiments, the expression“optical axis” means a straight line or a sequence of straight linesections through the centers of curvature of the optical components. Theoptical axis is folded on folding mirrors (deflection mirrors) or onother reflective surfaces. Directions and distances are described asbeing on the “image side” when they are directed in the direction of theimage plane or of the substrate which is located there and is to beexposed, and as on the “object side” when they are directed toward theobject plane or toward a reticle located there, with respect to theoptical axis. The object in the examples is a mask (reticle) with thepattern of an integrated circuit, although it may also be a differentpattern, for example a grating. The image in the examples is projectedonto a wafer which is provided with a photoresist layer and is used as asubstrate. Other substrates, for example elements for liquid crystaldisplays or substrates for optical gratings, are also possible.

FIG. 1 shows, schematically, a microlithographic projection exposuresystem in the form of a wafer stepper 1, which is intended forproduction of large-scale integrated semiconductor components by meansof immersion lithography. The projection exposure system 1 has anexcimer laser 2 as the light source, with an operating wavelength of 193nm, although other operating wavelengths, for example 157 nm or 248 nm,are also possible. A downstream illumination system 3 produces a large,sharply constricted, highly homogeneously illuminated illuminationfield, which is matched to the telecentric requirements of thedownstream projection objective 5 on its exit plane 4. The illuminationsystem 3 has devices for selection of the illumination mode and, in theexample, can be switched between conventional illumination with avariable coherence degree, annular field illumination and dipole orquadrupole illumination.

A device 40 (reticle stage) for holding and manipulating a mask 6 isarranged behind the illumination system in such a way that it is locatedon the object plane 4 of the projection objective 5, and can be moved ina departure direction 7 (y direction) on this plane, for scanningpurposes.

The plane 4, which is also referred to as the mask plane, is followed bythe catadioptric reduction objective 5, which images an image of themask on a reduced scale of 4:1 on a wafer 10 which is covered with aphotoresist layer. Other reduction scales, for example 5:1, 10:1 or100:1 or more, are likewise possible. The wafer 10 which is used as alight-sensitive substrate, is arranged such that the planar substratesurface 11 together with the photoresist layer essentially coincideswith the image plane 12 of the projection objective 5. The wafer is heldby a device 50 (wafer stage) which comprises a scanner drive in order tomove the wafer synchronously with the mask 6 and parallel to it. Thedevice 50 also has manipulators, in order to move the wafer both in thez direction parallel to the optical axis 13 of the projection objectiveand in the x and y directions at right angles to this axis. A tiltingdevice is integrated, and has at least one tilting axis which runs atright angles to the optical axis 13.

The device 50, which is provided for holding the wafer 10, is designedfor use for immersion lithography. It has a holding device 15, which canbe moved by a scanner drive and whose base has a flat depression orrecess for holding the wafer 10. A flat liquid-tight holder, which isopen at the top, for a liquid immersion medium 20 is formed by acircumferential rim 16, and the immersion medium 20 can be introducedinto the holder, and can be carried away from it, by devices that arenot shown. The height of the rim is designed such that the filledimmersion medium completely covers the surface 11 of the wafer 10, andthe exit-side end area of the projection objective 5 can be immersed inthe immersion liquid between the objective exit and the wafer surfacewhile the working distance is set correctly. The entire system iscontrolled by a central computer unit 60.

FIG. 2 schematically illustrates one preferred embodiment of projectionobjectives according to the invention. The projection objective 200 isused to image a pattern (which is arranged on its object plane 201) of amask on a reduced scale on its image plane 202, which is alignedparallel to the object plane, on a reduced scale. It has a first,refractive objective part 210, which images the object field to form afirst, real intermediate image 211, a second, catadioptric objectivepart 220, which images the first intermediate image to form a secondreal intermediate image 221, and a third, refractive objective part 230,which images the second intermediate image on a reduced scale on theimage plane 202. The catadioptric objective part 220 has a concavemirror 225. A first folding mirror 213 is arranged in the vicinity ofthe first intermediate image, at an angle of 45° to the optical axis204, such that it reflects the radiation coming from the object plane inthe direction of the concave mirror 225. A second folding mirror 223,whose planar mirror surface is aligned at right angles to the planarmirror surface of the first folding mirror, reflects the radiationcoming from the concave mirror 225 in the direction of the image plane202.

The folding mirrors 213, 223 are each located in the optical vicinity ofthe intermediate images, so that the light conductance value can be keptlow. The intermediate images, that is the entire region between theparaxial intermediate image and the marginal ray intermediate image, arepreferably not located on the mirror surfaces, thus resulting in afinite minimum distance between the intermediate image and the mirrorsurface, so that any faults in the mirror surface, for example scratchesor impurities, are not imaged sharply on the image plane. The minimumdistance should be set such that sub-apertures of the radiation, that isto say footprints of beams which originate from a specific field pointor converge on it do not have a diameter of less than 5 mm, or 10 mm, onthe mirror surface. Embodiments exist in which both the firstintermediate image 211, that is to say the second intermediate image 221as well, are located in the geometric space between the folding mirrorsand the concave mirror 225 (solid arrows). This side arm is alsoreferred to as the horizontal arm (HOA). In other embodiments, the firstintermediate image 211′ may be located in the beam path upstream of thefirst folding mirror 213, and the second intermediate image 221′ may belocated in the beam path downstream from the second folding mirror(arrows represented by dashed lines).

The folding angles in this exemplary embodiment are exactly 90°. This isadvantageous for the performance of the mirror layers of the foldingmirrors. Deflections by more or less than 90° are also possible, thusresulting in an obliquely positioned horizontal arm.

All of the objective parts 210, 220, 230 have a positive refractivepower. In the schematic illustration, lenses or lens groups with apositive refractive power are represented by double-headed arrows withpoints pointing outwards, while lenses or lens groups with a negativerefractive power are, in contrast, represented by double-headed arrowswith heads pointing inwards.

The first objective part 210 comprises two lens groups 215, 216 with apositive refractive power, between which a possible diaphragm positionexists where the chief ray 203, which is shown by a solid line,intersects the optical axis 204, which is shown by a dashed-dotted line.The optical axis is folded through 90° at the first folding mirror 213.The first intermediate image 211 is produced in the light pathimmediately downstream from the first folding mirror 213.

The first intermediate image 211 acts as an object for the subsequentcatadioptric objective part 220. This has a positive lens group 226close to the field, a negative lens group 227 close to the diaphragm,and the concave mirror 225 which is arranged immediately downstream fromthis and images the first intermediate image to form the secondintermediate image 221. The lens group 226, which has a positive effectoverall, is used as a “field lens” and is formed by a single positivelens, whose effect can also be produced, however, by two or moreindividual lenses with a positive refractive power overall. The negativelens group 227 comprises one or more lenses with a negative effect.

The second intermediate image 221, which is located opticallyimmediately in front of the second folding mirror 223, is imaged by thethird refractive objective part 230 on the image plane 202. Therefractive objective part 230 has a first positive lens group 235, asecond negative lens group 236, a third positive lens group 237 and afourth positive lens group 238. There is a possible diaphragm positionbetween the positive lens groups 237, 238, where the chief rayintercepts the optical axis.

FIG. 3 shows a lens section through a projection objective 300 which isessentially formed using the principles explained with reference to FIG.2. Identical or corresponding elements or element groups are annotatedwith the same reference symbols as in FIG. 2, increased by 100.

One special feature of the system is that a biconvex positive lens 326,through which the beam passes in two opposite directions, is providedgeometrically between the folding mirrors 313, 323 and the concavemirror 325 in a region of the projection objective through which thebeam passes twice, with the beam passing through it both in the lightpath between the first intermediate image 311 and the concave mirror 325and in the light path between the concave mirror and the secondintermediate image 321, or the image plane 302, in mutually offset lensareas. The positive lens 326 is arranged closer to the folding mirrors313, 323 than to the concave mirror 325, in particular in the firstthird of the axial distance between the folding mirrors and the concavemirror. In the region of the positive lens 326, the marginal ray heightis small in comparison to the chief ray height, with the ratio of themarginal ray height to the chief ray height being approximately 0.3. Thepositive lens 326 is thus arranged close to the field both with respectto the first intermediate image 311 and with respect to the secondintermediate image 321, and thus acts as a field lens for bothintermediate images. The positive refractive power in the light pathbetween the first intermediate image 311 and the concave mirror 325ensures, inter alia, that the diameters of the subsequent lenses 327 andof the concave mirror 325 can be kept small. The positive refractivepower in the light path from the concave mirror to the secondintermediate image 321 and to the image plane results in a reduction inthe incidence angle bandwidth of the radiation which also arrives at thesecond folding mirror 323 and can thus be coated with advantageousreflection layers, as well as for limiting the lens diameters in therefractive objective part 330 which is closest to the image field and isessentially responsible for production of the high image-side numericalaperture (NA=1.20) of the immersion projection objective.

The positive lens can be moved very close to the two intermediate imageswhen required, without being impeded by the folding mirrors, so that astrong correction effect is possible. The positive refractive powerwhich is arranged close to the field allows the horizontal arm to belonger. Because of the large aperture in the first intermediate image311, the length of the horizontal arm would normally be shortened, sothat the diameter of the concave mirror 325 and of the negative meniscuslenses in the negative group 327 which are arranged immediately upstreamof it is linked to the color correction and should therefore not beindefinitely large. The inclusion of a positive lens group 326 close tothe field also increases the refractive power of the negative lenses327, owing to the compensation for the Petzval curvature (in comparisonto the concave mirror), and thus increases the correction of the colorlongitudinal error for relatively small diameters in the area of theconcave mirror. The catadioptric objective part can thus be designed tobe compact and with relatively small lens dimensions, with adequatecolor correction.

The field lens 326 which is arranged in the immediate vicinity of twointermediate images 311, 321 also has major advantages with respect tooptical correction, as will be explained in more detail in the followingtext. In principle, it is advantageous for the correction of imagingerrors to have optical surfaces in the vicinity of intermediate imageswhich are subject to major aberrations. The reason for this is asfollows: at a long distance from the intermediate image, for example inthe vicinity of the system diaphragm or its conjugate planes, all of theopening rays in a light beam have a finite and monotonally rising heightwith the pupil coordinate, that is to say an optical surface acts on allthe opening rays. Opening beams which are located further outwards atthe pupil edge also have an increasingly greater height on this surface(or more correctly: an increasing distance from the chief ray).

However, this is no longer the case in the vicinity of an intermediateimage which is subject to severe aberrations. If one is, in fact,located within the caustic of the intermediate image, then it ispossible for the surface to be located approximately in or close to themarginal ray image, that is to say effectively it does not act on themarginal rays, but has a considerable optical effect on the zone rays.It is thus possible, for example, to correct a zone error in the opticalaberrations. This principle may be used, for example, in order todeliberately influence the spherical zone error.

The convex lens surface of the positive lens 326 which faces theintermediate images 311, 321 and is arranged in their immediateproximity is aspherically curved. In conjunction with the arrangementclose to the field, this allows a very major corrective effect to beachieved.

At least the two to three lenses closest to the image can bemanufactured from calcium fluoride, in order to avoid compactionproblems. In order to compensate for intrinsic birefringence, thecrystallographic major axes of the lenses can be rotated with respect toone another. The concave mirror 325 may also be in the form of an activemirror, in which the shape of the mirror surface can be varied by meansof suitable manipulators. This can be used to compensate for variousimaging errors. The beam path in the vicinity of at least one of theintermediate images is virtually telecentric.

Table 1 shows the specification of the design in tabular form. In thiscase, column 1 shows the number of the surface which is refractive,reflective or is distinguished in some other way, column 2 shows theradius r of the surface (in mm), column 3 shows the distance d betweenthe surface and the subsequent surface (in mm), column 4 shows thematerial of a component, and column 5 shows the optically useable freediameters of the optical components (in mm). Reflective surfaces areannotated by “R” in column 1. Table 2 shows the corresponding asphericaldata, with the arrow heights of the aspherical surfaces being calculatedusing the following rule:

p(h)=[((1/r)h ²/(1+SQRT(1−(1+K)(1/r)² h ²))]+C1*h ⁴ +C2*h ⁶+ . . . .

In this case, the reciprocal (1/r) of the radius indicates the surfacecurvature at the surface apex, and h indicates the distance between thesurface point and the optical axis. The arrow height is thus p(h), thatis to say the distance between the surface point and the surface apex inthe z direction, that is to say in the direction of the optical axis.The constants K, C1, C2, etc. are shown in Table 2.

The immersion objective 300 is designed for an operating wavelength ofabout 157 nm, at which the calcium fluoride which is used for all of thelenses has a refractive index of n=1.5593. This is matched to aperfluoropolyether (Fomblin®) which is used in vacuum technology, as animmersion medium for which n_(I)=1.37 at 157 nm, and has an image-sideworking distance of about 1.5 mm. The image-side numerical aperture NAis 1.2, and the imaging scale reduction factor is 4:1. The system isdesigned for an image field whose size is 26×5.0 mm², and it is doubletelecentric.

FIG. 4 shows a lens section through a projection objective 400 whichrepresents a variant of the embodiment shown in FIG. 3 and is likewiseformed using the principles explained with reference to FIG. 2.Identical or corresponding elements or element groups are annotated withthe same reference symbols as in FIG. 3, increased by 100. Thespecifications for this exemplary embodiment are shown in Tables 3 and4.

In this embodiment as well, a biconvex positive lens 426 which is usedas a field lens is arranged in the horizontal arm in the immediateoptical vicinity of the intermediate images 411, 421 which are arrangedbetween the folding mirrors 413, 423 and the concave mirror 425, thusresulting in the horizontal arm having small dimensions and on the otherhand in a major corrective effect to the intermediate images.

A further special feature of this embodiment is the design of the third,refractive objective part 430, which has a particularly compactconfiguration, with small dimensions and a small maximum diameter. Thebasic design with an initial positive group 435, followed by thenegative group 436 and two subsequent positive groups 437, 438 with anaperture diaphragm (aperture stop) A in between corresponds to thedesign shown in FIG. 3. The entry surface E of the third lens group 437is located behind the biconcave negative lens 436, which is the onlylens in the second lens group 436, in the area of maximum divergence ofthe beam diameter and in the area of a point of inflection of themarginal ray height. There are no negative lenses with a scatteringeffect that is significant for the optical design between this entrysurface and the aperture diaphragm A, or between the aperture diaphragmand the image plane. In particular, only positive lenses are providedbetween the entry surface E and the image plane.

If there are no negative lenses with a significant refractive power inthe region in which the beam diameter is relatively large then thisallows the maximum diameters of the lenses to be limited to practicablesizes in this region. “Relatively large beam diameter” for the purposesof this application occur in particular when the marginal ray height ona lens is at least as large as half the marginal ray height at apotential diaphragm position, for example at the system diaphragm. Thismeasure takes account of the fact that the scattering effect of anegative lens may admittedly be desirable for correction reasons, butthat any scattering effect downstream from the negative lens has atendency to lead to larger lens diameters than will be necessary in theabsence of a negative lens. Furthermore, the rays of the beam are joinedtogether in the direction of the downstream image plane, and positiverefractive power is required for this purpose. The positive lenses whichare required for this purpose may overall be designed relativelymoderately provided that there is also no need to compensate for thescattering effect of negative lenses in the combination of the beams.Furthermore, the number of lenses may be limited. The invention thusallows compact projection objectives with minimal lens dimensions.

FIG. 5 shows one embodiment of a projection objective 500 which, fromthe optical point of view, is designed on the basis of the principlesexplained with reference to FIG. 2. Identical or corresponding elementsor element groups are annotated with the same reference symbols as inFIG. 2, increased by 300.

A comparison between the beam profiles in the systems shown in FIG. 2and FIG. 5 shows that different beam paths are possible within the scopeof the invention. An uncrossed beam path is shown in the system in FIG.2, since a first beam section which runs from the object plane to theconcave mirror 225 and a second beam section which runs from thisconcave mirror to the image plane do not intersect anywhere. Theembodiment shown in FIG. 5, in contrast, has a crossed-over beam path.The first folding mirror 513 is arranged on the side of the optical axis504 facing away from the second folding mirror 523, with the secondfolding mirror being geometrically located closer to the object plane.In consequence, a first beam section 540 which runs from the objectplane 501 to the concave mirror 525 and a second beam section 550 whichruns from the concave mirror 525 via the second folding mirror 523 tothe image plane cross over in the region immediately upstream of themirror surface of the second folding mirror 523, in the vicinity of theintermediate images 511, 521. In this case, the second intermediateimage 521 is located optically immediately before the second foldingmirror 523, and geometrically in the vicinity of an inner mirror edge528, which faces the optical axis 504, of the first folding mirror. Thiscrossed beam path, in which the radiation is “forced by” the firstfolding mirror without any vignetting in the direction of the secondfolding mirror, in the region of the inner mirror edge 528, allowsoptimization of the light conductance value of the system. It alsoprovides more physical space for the two folding mirrors.

In this embodiment as well, the positive field lens group 526 is locatedin the optical vicinity of both intermediate images, geometricallybetween the folding mirrors and the concave mirror, although the secondfolding mirror and the second intermediate image are somewhat furtheraway from the positive lens 526.

One embodiment of a projection objective 600 will be explained withreference to FIG. 6, in which a pattern which is arranged on its objectplane 601 is imaged on an image plane 602 aligned parallel to the objectplane, generating two real intermediate images 611, 621. The projectionobjective has a first, catadioptric objective part 610 which produces afirst real intermediate image 611 of the object field, a subsequent,catadioptric second objective part 620, which images the firstintermediate image to form a second real intermediate image 621, and asubsequent third, refractive objective part, which images the secondintermediate image 621 directly, that is to say without any furtherintermediate image, on the image plane 602.

One major difference from the embodiments described so far is that thefirst objective part 610 is a compact catadioptric subsystem. Thecatadioptric objective part 610 has a concave mirror 615 whose opticalaxis is at right angles to the object plane, and apolarization-selective beam splitter 660 (Beamsplitter Cube, BSC) whichis arranged between the object plane and the concave mirror and has aplanar beam splitter surface 613 which is inclined at 45° to the opticalaxis 604 and is used as a first folding mirror for the projectionobjective 610. A λ/4 plate 661, a first positive group 662, a secondpositive group 663, the beam splitter 660, a further λ/4 plate 664 and anegative group 665 arranged immediately in front of the concave mirrorare arranged in this sequence between the object plane and the concavemirror. This is followed by a further λ/4 plate 666 and a positive group667 in the beam path downstream from the folding mirror 613. The basicconfiguration of the second, catadioptric objective part 620 with apositive group 626 close to the field corresponds essentially to thebasic design shown in FIG. 2. The third, refractive objective part hasonly positive groups between which a diaphragm position is located.

In this exemplary embodiment, folding thus takes place within the first,catadioptric objective part, with positive refractive power in the formof at least one positive lens 667 being arranged between the foldingmirror 613, which is responsible for this, and the first intermediateimage 611, which is produced by the first subsystem. The overall systemis operated with circularly polarized input light, which is converted bythe first λ/4 plate to linear-polarized radiation, which is p-polarizedwith respect to the obliquely positioned beam splitter layer 613 andthus essentially completely passes through it to the concave mirror 650.The λ/4 plate which is arranged between the beam splitter layer and theconcave mirror is passed through twice by the linear-polarized radiationand in the process rotates the polarization preferred direction through90° such that the radiation arriving from the concave mirror at thepolarization splitter layer 613 is s-polarized with respect to this, andis reflected in the direction of the subsequent objective parts. Thethird λ/4 plate 666 converts the radiation to circularly polarizedradiation, which then passes through the subsequent subsystems.

Since the first, catadioptric objective part 610 can be designed suchthat, in conjunction with the mirror curvature and the negativerefractive power upstream of the mirror, it can largely or completelycorrect both the image field curvature and the chromatic longitudinalaberration, the subsequent partial objectives are not loaded, or areonly slightly loaded, by these imaging errors. Furthermore, thisarrangement allows the physical space between the object plane and thehorizontally aligned, catadioptric objective part 620 to be enlarged,which can be used in order to reduce the light conductance value.

The aperture diaphragm A is preferably arranged in the third objectivepart 630, which is closest to the image, where the chief ray intersectsthe optical axis. Two further possible diaphragm positions are shown inthe first and second objective part, in each case close to the concavemirrors 615, 625.

The first objective part may be physically compact. FIG. 7 shows anembodiment of a catadioptric subsystem which can be used as the firstobjective part 610 for the system shown in FIG. 6, and whosespecification is shown in Table 5. Identical or corresponding elementsor element groups are annotated with the same reference symbols as inFIG. 6, increased by 100. All the lenses are spherical, and all thetransparent components including the beam splitter block 760 arecomposed of synthetic quartz glass.

FIGS. 8 a-8 e show various implementation options, schematically, forthe folding mirrors which are provided for folding the beam path. Thefolding mirrors may, for example, be in the form of free-standing planarmirrors, in particular as front surface mirrors (FIGS. 8 a and 8 b). Inthis case, in the embodiments shown in FIG. 2, separate mirrors as shownin FIG. 8 b can be held jointly, as well. The folding mirrors may alsobe in the form of free-standing prisms, as shown in FIGS. 8 c and 8 d.The reflective prism surfaces may, if required, act as total internalreflection surfaces depending on the incidence angles that occur onthem, or may have a reflection coating. In particular for theembodiments shown in FIGS. 2 to 4, the mirrors may also be in the formof reflective outer surfaces of a mirror prism as shown in FIG. 8 e.

In FIG. 9 a further embodiment of a projection objective 900 havingR-C-R-type as explained in connection with FIG. 2 is shown. Reference ismade to that description for the basic construction. A first, refractiveobjective part 910 is designed to image an off-axis effective objectfield OF arranged in the object surface 901 onto a first intermediateimage 911. A first planar folding mirror 913 is arranged within thefirst objective part immediately upstream of the first intermediateimage. A second, catadioptric objective part 920 including a concavemirror 925 is designed for imaging the first intermediate image into asecond intermediate image 921 positioned immediately upstream of asecond folding mirror 923 at a distance therefrom. A third, refractiveobjective part 930 including a freely accessible aperture stop AS isdesigned to image the second intermediate image onto the image surface902, where an effective image field IF arranged outside the optical axisis created. The first objective part 910 serves as a relay system toplace the first intermediate image close to the first folding mirror913. The catadioptric second objective part 920 includes a singlepositive lens (field lens 926) geometrically close to the foldingmirrors and optically close to both intermediate images, therebyallowing efficient correction of field related imaging errors. The thirdobjective part serves as a focussing lens group providing the major partof the reduction ratio of the projection objective to obtain the imageside numerical aperture, which is NA=1.20 in this embodiment at a fieldsize of 26 mm·5.5 mm of the effective object field OF. The overall tracklength (axial distance between object surface 901 and image surface 902)is 1400 mm. The wavefront aberration is about 4 mλ rms. Thespecification is given in tables 9, 9A. The chief ray CR of the imagingis drawn bold to facilitate following trajectory of the chief ray.

The lenses of the first objective part 910 define a first part OA1 ofthe optical axis, which is the axis of rotational symmetry of the lensesand is perpendicular to the object surface 901. The axis of rotationalsymmetry of the concave mirror 925 and the lenses of the secondobjective part define a second part OA2 of the optical axis which, inthis embodiment, is aligned perpendicular to the object side first partOA1 of the optical axis. With other words, the optical axis is folded bythe first folding mirror 913 at 90°. The lenses of the third objectivepart 930 define a third part OA3 of the optical axis, which is parallelto the first part OA1 of the optical axis and perpendicular to the imagesurface 902. In this embodiment, the object-side first part OA1 of theoptical axis and the image-side third part OA3 of the optical axis arecoaxial such that no lateral axis offset exists between these parts ofthe optical axis. This construction may be desirable with regard tomounting of the lenses of the refractive objective parts. A similarconstruction with coaxial first and third parts OA1, OA3 of the opticalaxis is shown as projection objective 1000 in FIG. 10. The specificationof that design is given in table 10, 10A. In both embodiments a finitevalue for the object-image-shift OIS exists.

In the projection objective 900 the lens surface ASP immediatelyupstream of the first folding mirror 913 is an aspheric surface, whichis optically close to the first intermediate image. Efficient correctionof field related imaging errors are obtained. In the projectionobjective 1000 the field lens 1026 has an aspheric lens surface ASPfacing the concave mirror. This aspheric surface is the lens surfaceclosest to both the first and second intermediate image 1011, 1021 andtherefore very effective for correction at two positions along the beampath. The wave front aberration of this design is about 3 mλ rms.

The embodiment of a projection objective 1100 shown in FIG. 11 a(specification in tables 11, 11A) is an example to demonstrate thatpractical advantages can be obtained in preferred embodiments if alateral axis offset AO between the first part OA1 of the optical axis onthe object side and a third part OA3 of the optical axis on the imageside is adjusted appropriately. In order to facilitate understanding ofthe terms used in the following, FIG. 11 b shows a schematic drawingwhere important features and parameters are shown.

From an optical point of view, an off-axis effective object field OF isimaged by the first objective part 1110 into a first intermediate image1111 arranged between a first folding mirror 1113 and a positive fieldlens 1126 of the second objective part 1120. The second objective partincludes the concave mirror 1125 and is designed as an imaging subsystemto create a second intermediate image 1121 positioned between positivelens 1126 and a second folding mirror 1123. The third objective part1130 serves as a focussing group to generate the off-axis effectiveimage field IF at a very high image-side numerical aperture NA, whereinhere NA=1.30.

In contradistinction to the embodiments of FIGS. 9 and 10 the foldingprism forming with perpendicular planar faces the first and secondfolding mirrors is used asymmetrically, whereby a lateral axis offset AOis obtained between the first part OA1 of the optical axis on the objectside and the third part OA3 of the optical axis on the image side (seeFIG. 11 b). In this particular embodiment the axis offset AO is set insuch a way that an object field center axis OFCA running parallel to thefirst part OA1 of the optical axis through the object field center andan image field center axis IFCA running through the center of the imagefield IF and parallel to the third part OA3 of the optical axis coincide(are coaxial). With other words, there is no object-image-shift (OIS)between the centers of the effective object field OF and image field IF.This property is usually not obtained in catadioptric projectionobjectives with off-axis object field, but only in projection objectiveshaving an effective object field centered around the optical axis (e.g.purely refractive objectives or catadioptric objectives having aphysical beam splitter or objectives with pupil obscuration). As evidentfrom FIG. 11 b the amount of lateral axis offset AO is to be set suchthat the sum of the lateral axis offset AO and an image field centerheight h′ is equal to the object field center height h if OIS=0 isdesired. In that case:

|AO|=|h*(1+|β|)|.

Another beneficial aspect of preferred embodiments of the inventionrelates to an appropriate selection of positive refractive power for thefield lens. As will be demonstrated exemplarily in the following, aproper selection of refractive power allows to manufacture projectionobjectives with very high image side numerical apertures, such as NA=1.3or NA=1.35, while maintaining a maximum size of lenses upstream and/ordownstream of the folding mirrors and the overall track length of theprojection objective moderate. For demonstration purposes, FIG. 12 showsa variant of a prior art projection objective of type R-C-R as shown inWO 2004/019128 having an image side numerical aperture NA=1.25 and 1250mm track length, which is smaller than the track length of the relatedprior art objective (1400 mm, FIG. 19 in WO 2004/019128 A1). There is nofield lens geometrically between the folding mirrors and the concavemirror.

For comparison, FIG. 13 shows a projection objective 1300 as anembodiment of the invention, having the same numerical aperture(NA=1.25) and track length (1250 mm), where a positive field lens 1326is positioned geometrically between the folding mirrors 1313, 1323 andthe concave mirror 1325. To facilitate comparison, schematic FIGS. 14a-14 b show a prior art system without field lens in FIG. 14 a and anembodiment of the invention including a field lens FL in FIG. 14 b. Thetrajectory of a chief ray CR is drawn and bold in FIGS. 12 and 13 andalso outlined in FIGS. 14 a-14 b where, in addition, the trajectory of amarginal ray MR is shown.

Next, some characteristic features of prior art systems related to theembodiment of FIG. 12 are summarized using the reference identificationsof FIG. 14 a. The first objective part is a refractive relay group L1designed to create the first intermediate image IMI1 close to the firstfolding mirror FM1 of the folding prism. An axially compact (short)catadioptric second objective part including the concave mirror CMcreates the second intermediate image IMI2 close to the second foldingmirror FM2. A purely refractive main focussing group L2 formed by thethird objective part forms the image.

The first objective part is subdivided into a first lens group LG1 and asecond lens group LG2 (each positive refractive power), a pupil surfacebeing positioned between these lens groups where the chief ray CRintersects the optical axis OA. The third objective part includes, inthat sequence, a third lens group LG3 with positive refractive power, afourth lens group LG4 with negative refractive power, and a fifth lensgroup LG5 with positive refractive power. An image side pupil surface ispositioned in the third objective part where the chief ray crosses theoptical axis. An aperture stop AS is usually positioned at thisposition. A pupil surface optically between the first and secondintermediate image is positioned close to or at the concave mirror CM.

Alternatively an aperture stop may also be positioned in one of theother pupil surfaces, namely in the refractive relay group L1 or in thecatadioptric group, close to the concave mirror.

The chief ray CR is convergent at the first intermediate image IMI1 andthe first folding mirror optically close to that intermediate image.Here, a convergent chief ray is a chief ray where the chief ray heightCRH, i.e. the radial distance between the chief ray and the opticalaxis, is decreasing in light propergation direction. On the other hand,the chief ray is divergent (i.e. chief ray height increasing in lightpropergation direction) at the second intermediate image IMI2 and thesecond folding mirror.

Due to the folding geometry having the intermediate images between thefolding mirrors and the concave mirror, the lenses of the second lensgroup LG2 and the third lens group LG3 closest to the first intermediateimage and the second intermediate image, respectively, are opticallyrelatively far away from the intermediate images since the foldingmirror is placed between these lenses and the intermediate images. As aconsequence of the convergence/divergence of the chief ray these lensesclosest to the folding mirrors have a tendency to become large (largelens diameter). Note that this effect may be weaker if a larger distanceis set between the concave mirror and the folding mirrors, therebyforming a longer horizontal arm (HOA) of the objective.

Given these conditions, there is a tendency for the horizontal opticalaxis to become shorter if the image side numerical aperture NA is to beincreased. This can be understood as follows. The primary purpose of theconcave mirror is to correct the Petzvalsum (image field curvature) ofthe projection objective. The contribution of the concave mirror forPetzval sum correction is directly proportional to the curvature of theconcave mirror. If the numerical aperture of the system is to beincreased and, at the same time, the length of the horizontal arm HOAwould remain constant, the diameter of the catadioptric group includingthe concave mirror would be increased. One potential consequence is thatthe curvature of the concave mirror would become smaller, whereby theeffect of the concave mirror on Petzval sum correction would decrease.This is considered less desirable since the Petzval sum correction mustthen be provided in other parts of the projection objective, therebymaking the design more complicated.

On the other hand, if it desired to maintain the correcting effect ofthe catadioptric group on Petzval sum correction, the diameter of thecatadioptric group including the concave mirror should be maintainedessentially constant. This, however, corresponds to a decreasing lengthof the horizontal arm which, in turn, leads to relatively large chiefray angles at the intermediate images, as shown schematically in FIG. 14a and in the projection objective 1200 of FIG. 12.

It is evident from FIG. 12 that very large lens diameters are requiredparticularly for the two or three positive lenses of the second lensgroup LG2 immediately upstream of the first folding mirror.

However, if it is desired to increase the numerical aperture, sufficientspace for lenses must be provided in the third objective part, mainly inthe vicinity of the closest pupil position next to the wafer. If it isfurther desired to limit the track length of the objective to reasonablevalues, it appears that it is desirable to design the first objectivepart (relay group L1) axially shorter and to decrease the diameters ofthe lenses immediately upstream of the first folding mirror.

These objects can be obtained by introducing a field lens havingsufficient positive refractive power geometrically between the foldingmirrors and the concave mirror optically close to the intermediateimages, as shown schematically in FIG. 14 b and exemplarily inembodiment 1300 of FIG. 13. As evident from FIG. 13, the positiverefractive power provided by a lens 1326 allows to guide the chief rayCR almost parallel to the optical axis or slightly divergent onto thefirst folding mirror 1313, whereby the diameters of the two or threelenses immediately upstream of the first folding mirror can besubstantially reduced when compared to the design of FIG. 12. Also, thefirst axial length AL1 of the first objective part 1310 is substantiallyreduced when compared to the corresponding length of the first objectivepart 1210 in FIG. 12. As a consequence, more space is available in thethird objective part for introducing lenses contributing to an increasein numerical aperture. Also, the horizontal arm including the concavemirror is substantially longer and the concave mirror is substantiallysmaller when a field lens is introduced.

In the embodiment of FIG. 13, it is also evident that both the first andsecond intermediate image are positioned in a space between the fieldlens 1326 and the mirror group including the concave mirror 1325.Specifically, an axial distance between the intermediate images and theclosest optical surface (lens surface of positive lens 1326 facing theconcave mirror) is sufficiently large such that the closest opticalsurface lies outside an intermediate image space defined axially betweenthe paraxial intermediate image (intermediate image formed by paraxialrays) and the marginal ray intermediate image (formed by marginal raysof the imaging). A minimum distance of at least 10 mm is obtained here.The field lens is effective as a last lens of the first objective part1310 and as a first lens of the third objective part 1330 (when viewedin light propagation direction at the intended use as reductionprojection objective). Therefore, it is worth to note that FIG. 13 showsa projection objective having two refractive imaging subsystems (formedby the first objective part 1310 and the third objective part 1330),where a lens (the field lens 1326) is arranged optically within both thefirst and the third imaging subsystem. Also, each folding mirror ispositioned inside a refractive imaging subsystem between lenses of therespective subsystem.

The embodiments of the following FIGS. 15 to 17 (specifications intables 15, 15A, 16, 16A and 17, 17A, respectively) are based on theembodiment of FIG. 13 and show exemplarily that a basic design having afield lens with sufficient refractive power allows to obtain even higherimage side numerical apertures with moderate lens sizes. Thespecifications are given in tables 15, 15A, 16, 16A and 17, 17A,respectively.

An image side numerical aperture NA=1.30 is obtained for the projectionobjective 1500 in FIG. 15. Here, the chief ray CR is almost parallel tothe optical axis at the first and second folding mirror. Specifically, afirst chief ray direction cosine |CRA1|=0.055 is obtained at the firstfolding mirror and a second chief ray direction cosine CRA2=0.058 isobtained at the second folding mirror.

In the projection objectives 1300 and 1500, the positive field lens1326, 1526 in the horizontal arm is arranged very close to the foldingmirrors such that intermediate images follow within a space free ofoptical material between that field lens and the concave mirror.However, as evident from the intersecting lens symbols, one or moretruncated lenses must be used close to the folding mirrors, which makeslens mounting more complicated.

Such mounting problem is avoided for the projection objective 1600 inFIG. 16, where the positive field lens 1626 is positioned far away fromthe folding mirrors 1613, 1623 mostly outside a cylindrical spacedefined between the lenses immediately upstream and downstream of thefolding mirrors. In this embodiment, circular lenses with a stablemounting technique can be used. From an optical point of view, the chiefray angles at the first and second folding mirrors are almost zero(essentially telecentric chief ray). As both intermediate images 1611and 1621 are positioned essentially between the folding mirrors and thefield lens 1626, the field lens is now part of the catadioptric secondimaging objective part 1620 including the concave mirror 1625. In thisvariant, the installation space problem close to the folding mirror isavoided. An image side numerical aperture NA=1.30 is obtained.

The design type has potential for even higher numerical apertures, whichis evident from projection objective 1700 shown in FIG. 17 having animage side numerical aperture NA=1.35. Like in the embodiment of FIG.16, the chief ray is almost telecentric at the folding mirrors and theintermediate images 1711, 1721 are essentially positioned between thefolding mirrors and the field lens 1726. The increase in numericalaperture with respect to the embodiment of FIG. 16 shows that in thatembodiment sufficient space for further and/or stronger lenses isavailable in the third objective part responsible for providing the highnumerical aperture.

As mentioned earlier, the invention allows to built catadioptricprojection objectives with high numerical aperture, particularlyallowing immersion lithography at numerical apertures NA>1, that can bebuilt with relatively small amounts of optical material. The potentialfor small material consumption is demonstrated in the followingconsidering parameters describing the fact that particularly compactprojection objectives can be manufactured.

Generally, the dimensions of projection objectives tend to increasedramatically as the image side numerical aperture NA is increased.Empirically it has been found that the maximum lens diameter D_(max)tends to increase stronger than linear with increase of NA according toD_(max)˜NA^(k), where k>1. A value k=2 is an approximation used for thepurpose of this application. Further, it has been found that the maximumlens diameter D_(max) increases in proportion to the image field size(represented by the image field height Y′, where Y′ is the maximumdistance between an image field point and the optical axis). A lineardependency is assumed for the purpose of the application. Based on theseconsiderations a first compactness parameter COMP1 is defined as:

COMP1=D _(max)/(Y′·NA²).

It is evident that, for given values of image field height and numericalaperture, the first compaction parameter COMP1 should be as small aspossible if a compact design is desired.

Considering the overall material consumption necessary for providing aprojection objective, the absolute number of lenses, N_(L) is alsorelevant. Typically, systems with a smaller number of lenses arepreferred to systems with larger numbers of lenses. Therefore, a secondcompactness parameter COMP2 is defined as follows:

COMP2=COMP1·N _(L).

Again, small values for COMP2 are indicative of compact optical systems.

Further, projection objectives according to preferred embodiments of theinvention have at least three objective parts for imaging an entry sidefield surface into an optically conjugate exit side field surface, wherethe imaging objective parts are concatenated at intermediate images.Typically, the number of lenses and the overall material necessary tobuild an projection objective will increase the higher the number N_(OP)of imaging objective parts of the optical system is. It is desirable tokeep the average number of lenses per objective part, N_(L)/N_(OP), assmall as possible. Therefore, a third compactness parameter COMP3 isdefined as follows:

COMP3=COMP1·N _(L) /N _(OP).

Again, projection objectives with low optical material consumption willbe characterized by small values of COMP3.

Table 18 summarizes the values necessary to calculate the compactnessparameters COMP1, COMP2, COMP3 and the respective values for theseparameters for each of the systems presented with a specification table(the table number (corresponding to the same number of a figure) isgiven in column 1 of table 18). Therefore, in order to obtain a compactcatadioptric projection objective having at least one concave mirror andat least two imaging objective parts (i.e. at least one intermediateimage) at least one of the following conditions (1) to (3) should beobserved:

COMP1<11  (1)

Preferably COMP1<10.7 should be observed.

COMP2<340  (2)

Preferably COMP2<320, more preferably COMP2<300 should be observed.

COMP3<110  (3)

Preferably COMP3<100 should be observed.

In some embodiments COMP1<11 and, at the same time, COMP2<340, whichallows particularly compact designs.

Another aspect concerns the size of the concave mirror, which isparticularly small in relation to the largest lenses in someembodiments, thereby facilitating manufacturing and mounting. In someembodiments the concave mirror has a mirror diameter D_(M), theprojection objective has a maximum lens diameter D_(max), and thecondition D_(M)<0.75 D_(max) holds. Preferably D_(M)<0.70*D_(max) may befulfilled.

Table 18 shows that preferred embodiments according to the inventiongenerally observe at least one of these conditions indicating thatcompact designs with moderate material consumption and/or small concavemirror are obtained according to the design rules laid out in thisspecification.

The invention has been described in detail using examples of R-C-R typecatadioptric projection objectives having a first folding mirror fordeflecting the radiation coming from the object plane in the directionof the concave mirror and a second folding mirror for deflecting theradiation coming from the concave mirror in the direction of the imageplane. The invention can also be implemented in designs having differentfolding geometry, for example those where radiation coming from theobject plane is directly directed at the concave mirror prior to areflection on a first folding mirror arranged for deflecting theradiation coming from the concave mirror in the direction of the imageplane. In those embodiments, a second folding mirror is usually provideddownstream of the first folding mirror to allow a parallel arrangementof object plane and image plane.

It is self-evident that all of the systems described above may becomplete systems, that is to say systems for forming a real image (forexample on a wafer) of a real object (for example a photolithographymask). The systems may, however, also be used as subsystems for largersystems. For example, the “object” of one of the systems described abovemay thus be an image which is produced by an imaging system (for examplea relay system) positioned upstream of the object plane. An image whichis formed by one of the systems described above may likewise be used asan object for a system (for example a relay system) downstream from theimage plane. The enumeration of the objective parts with the expressions“first objective part” and “second objective part” etc. relates to thesequence in which the beam passes through them when they are used as areduction objective. The expressions “first” and “second” etc. should beunderstood as being relative to one another. The “first” objective partis arranged upstream of the “second” objective part in the direction inwhich the beam passes through them. This need not necessarily be thefirst objective part in the overall system, that is to say the objectivepart which immediately follows the image plane in the system. However,this is the case in the illustrated exemplary embodiments.

TABLE 1 NA = 1.2 Y = 57.7 mm WL 157.2852 157.2862 157.2842 CAF21.55930394 1.55930133 1.55930655 IMM 1.37021435 1.37021206 1.37021665Surface Radius Distance Material ½ Diameter  0 0.000000000 48.029632171AIR 57.700  1 0.000000000 39.172776328 AIR 72.768  2 −96.97140743843.719958386 CAF2 74.418  3 −158.002766036 5.165244231 AIR 98.534  4781.518257267 56.238731708 CAF2 120.188  5 −253.290501301 4.909571912AIR 123.211  6 288.016848173 49.396794919 CAF2 124.172  7 −435.16808715726.736905514 AIR 122.368  8 105.910945049 62.394238960 CAF2 94.783  9178.598362309 79.753912118 AIR 79.042 10 −274.352911686 15.001130830CAF2 42.116 11 −481.511902624 46.498544862 AIR 46.787 12 −70.44211785052.555341121 CAF2 55.942 13 −90.455727573 1.806830035 AIR 78.160 143232.255140950 36.176140320 CAF2 91.116 15 −186.488036306 1.000000000AIR 92.734 16 365.731282758 20.809036457 CAF2 90.268 17 −2611.121142850101.825417590 AIR 88.935 18 0.000000000 0.000000000 AIR 84.274 190.000000000 65.181628952 AIR 84.274 20 258.735107311 37.578859051 CAF2105.187 21 −1152.159158690 288.921175238 AIR 104.969 22 −129.27945840815.003276235 CAF2 81.991 23 −2262.350961510 56.312694509 AIR 88.341 24−117.450410520 15.001009008 CAF2 91.957 25 −309.800170740 28.401147541AIR 113.929 26 R −175.988719829 0.000000000 AIR 117.602 27 R 0.00000000028.401147541 AIR 168.871 28 309.800170740 15.001009008 CAF2 112.745 29117.450410520 56.312694509 AIR 87.774 30 2262.350961510 15.003276235CAF2 78.116 31 129.279458408 288.921175238 AIR 70.315 32 1152.15915869037.578859051 CAF2 91.290 33 −258.735107311 65.181629067 AIR 91.634 340.000000000 0.000000000 AIR 84.438 35 0.000000000 95.566202561 AIR84.438 36 −385.455042894 15.000000000 CAF2 93.816 37 −452.4759046341.000000003 AIR 97.482 38 254.248242468 32.034900497 CAF2 105.601 395899.473023640 1.000023801 AIR 105.353 40 190.848967014 30.278271846CAF2 104.456 41 621.351654529 138.920391104 AIR 102.039 42−123.640610032 33.881654714 CAF2 76.579 43 158.155949669 49.867792861AIR 80.512 44 412.757602921 47.829461944 CAF2 98.825 45 −208.94991265617.094373280 AIR 103.896 46 −158.641772839 15.212844332 CAF2 105.038 47−313.678744542 1.052590482 AIR 118.827 48 −829.528825093 55.527291516CAF2 125.550 49 −184.492343437 11.796257723 AIR 129.573 50 260.69680033737.374556186 CAF2 132.314 51 497.808165974 65.844307831 AIR 127.088 STO0.000000000 0.000000000 AIR 127.776 53 0.000000000 −22.615444914 AIR128.288 54 358.239917958 44.763751865 CAF2 128.404 55 −739.4949968551.004833255 AIR 127.649 56 242.528908132 44.488018592 CAF2 121.037 573949.584753010 1.000094237 AIR 116.970 58 201.527861764 58.711711773CAF2 103.897 59 −1366.391075450 1.000007100 AIR 89.104 60 62.43963963163.828426005 CAF2 55.026 61 0.000000000 1.550000000 IMM 17.302 620.000000000 0.000000000 AIR 14.425

TABLE 2 Aspherical constant Surface No. 2 Surface No. 7 Surfface No. 12K 0.0000 K 0.0000 K 0.0000 C1 1.90827109e−008 C1 4.29834963e−008 C17.12539594e−008 C2 1.04825601e−012 C2 −9.32018657e−013 C27.81169353e−012 C3 −1.78093208e−017 C3 3.88421097e−017 C32.24285994e−016 C4 2.90254732e−020 C4 −1.41048066e−021 C42.70399434e−019 C5 −9.28646308e−025 C5 3.20036532e−026 C5−5.33658325e−023 C6 9.92757252e−029 C6 −2.55377630e−031 C61.07824675e−026 C7 0.00000000e+000 C7 0.00000000e+000 C7 0.00000000e+000C8 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C90.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 Surface No. 17Surface No. 20 Surface No. 22 K 0.0000 K 0.0000 K 0.0000 C13.44530878e−008 C1 5.99206839e−009 C1 6.63814399e−008 C2−3.20209778e−013 C2 −2.26778093e−013 C2 1.50151781e−012 C34.32090602e−018 C3 −5.52734742e−019 C3 3.42715896e−017 C43.71891782e−022 C4 3.37919534e−022 C4 1.13418489e−020 C5−2.41461999e−026 C5 −2.42416300e−026 C5 −1.20800658e−024 C66.86020285e−031 C6 5.56746821e−031 C6 1.36760067e−028 C7 0.00000000e+000C7 0.00000000e+000 C7 0.00000000e+000 C8 0.00000000e+000 C80.00000000e+000 C8 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000C9 0.00000000e+000 Surface No. 31 Surface No.. 33 Surface No. 41 K0.0000 K 0.0000 K 0.0000 C1 −6.63814399e−008 C1 −5.99206839e−009 C13.02036913e−008 C2 −1.50151781e−012 C2 2.26778093e−013 C2−8.49897291e−013 C3 −3.42715896e−017 C3 5.52734742e−019 C3−2.62757380e−018 C4 −1.13418489e−020 C4 −3.37919534e−022 C42.42290737e−021 C5 1.20800658e−024 C5 2.42416300e−026 C5−1.80384886e−025 C6 −1.36760067e−028 C6 −5.56746821e−031 C64.40130958e−030 C7 0.00000000e+000 C7 0.00000000e+000 C7 0.00000000e+000C8 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C90.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 Surface No. 42Surface No. 44 Surface No. 51 Surface No. 59 K 0.0000 K 0.0000 K 0.0000K 0.0000 C1 1.57083344e−007 C1 −6.63114425e−008 C1 3.97980700e−008 C13.28933356e−008 C2 −5.70047014e−012 C2 1.06389778e−012 C2−1.14363396e−015 C2 −4.67953085e−013 C3 9.96269363e−016 C3−1.73700448e−016 C3 2.12173627e−019 C3 1.96156711e−017 C4−9.51074757e−020 C4 7.83565903e−021 C4 −1.81177143e−022 C41.01627452e−022 C5 2.78023503e−024 C5 −3.69851418e−025 C5−9.65440963e−027 C5 −3.59201172e−026 C6 2.11268686e−028 C66.43100123e−031 C6 3.69511989e−031 C6 2.16163436e−030 C7 0.00000000e+000C7 0.00000000e+000 C7 0.00000000e+000 C7 0.00000000e+000 C80.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000C9 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 C90.00000000e+000

TABLE 3 NA = 1.1 Y = 57.7 mm WL 157.2852 157.2862 157.2842 CAF21.55930394 1.55930133 1.55930655 Surface Radius Distance Material ½Diameter  0 0.000000000 47.596241819 AIR 57.700  1 0.00000000021.484078486 AIR 71.361  2 −130.196528296 81.232017348 CAF2 71.411  3−201.970612192 1.090292328 AIR 102.064  4 0.000000000 43.035190104 CAF2111.239  5 −219.688636866 1.000008083 AIR 113.511  6 196.83517745448.645753259 CAF2 112.440  7 −1062.563638620 1.011278327 AIR 109.626  8102.486371771 51.257817769 CAF2 88.766  9 125.152226832 78.537765316 AIR72.052 10 −276.036111675 19.246024827 CAF2 35.565 11 −344.55912945944.417965355 AIR 42.153 12 −73.158562407 46.803238343 CAF2 53.934 13−81.595671547 1.005611042 AIR 71.774 14 917.859457951 35.862144308 CAF283.802 15 −184.688054893 1.002179985 AIR 85.191 16 520.34229205423.034106261 CAF2 82.478 17 −768.099839930 99.999802859 AIR 80.816 180.000000000 0.000000000 AIR 72.928 19 0.000000000 49.999962118 AIR72.928 20 241.487091044 30.190977973 CAF2 85.575 21 −1164.355916310264.025266484 AIR 85.757 22 −132.516232462 15.000193519 CAF2 81.831 23−1356.484422410 61.385058143 AIR 89.265 24 −108.588059874 14.999993604CAF2 92.698 25 −296.429590341 28.045104017 AIR 119.543 26 R−171.604551151 0.000000000 AIR 121.617 27 R 0.000000000 28.045104017 AIR187.566 28 296.429590341 14.999993604 CAF2 118.640 29 108.58805987461.385058143 AIR 87.692 30 1356.484422410 15.000193519 CAF2 75.436 31132.516232462 264.025266484 AIR 68.614 32 1164.355916310 30.190977973CAF2 79.925 33 −241.487091044 49.999914356 AIR 79.985 34 0.0000000000.000000000 AIR 73.069 35 0.000000000 107.612168038 AIR 73.069 36−693.184976623 16.117644573 CAF2 81.276 37 −696.986438150 2.228062889AIR 84.557 38 272.001870523 26.851322582 CAF2 90.453 39 −11518.0149647001.683452367 AIR 90.747 40 204.924277454 41.781211890 CAF2 91.627 413033.528484830 106.582128113 AIR 88.228 42 −134.400581416 22.683343530CAF2 70.595 43 149.085276952 30.111359058 AIR 72.323 44 −1571.45928155066.592767742 CAF2 74.527 45 −685.256687590 11.096249234 AIR 101.072 46−661.646567779 85.751986497 CAF2 106.788 47 −157.414472118 1.578582665AIR 121.872 48 281.442061787 38.097581301 CAF2 126.470 49 2477.67119311077.916990124 AIR 123.978 50 0.000000000 0.000000000 AIR 117.805 510.000000000 −4.224796803 AIR 118.082 52 629.850672554 48.195853438 CAF2118.380 53 −440.009879814 0.999978780 AIR 118.034 54 243.61340829852.262412712 CAF2 109.822 55 11973.088705700 1.027491789 AIR 101.920 56115.269169988 60.712228046 CAF2 83.889 57 372.135519803 1.030688086 AIR63.468 58 72.776794128 53.208894511 CAF2 48.890 59 0.0000000000.000000000 CAF2 14.425 60 0.000000000 0.000000000 AIR 14.425

TABLE 4 Aspherical constants Surface No. 2 Surface No. 7 Surface No. 12K 0.0000 K 0.0000 K 0.0000 C1 −4.90420246e−011 C1 2.96559302e−008 C16.82301843e−008 C2 7.22127484e−014 C2 −4.45892297e−013 C26.13339976e−012 C3 1.72996941e−017 C3 1.35851832e−017 C3−1.47536226e−016 C4 −3.83158229e−021 C4 −9.75107227e−022 C4−7.56092252e−020 C5 1.65903133e−024 C5 6.40021152e−026 C51.52586945e−023 C6 −1.68929866e−028 C6 −9.93085086e−031 C6−1.35801785e−027 C7 0.00000000e+000 C7 0.00000000e+000 C70.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000C9 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 Surface No. 17Surface No. 20 Surface No. 22 K 0.0000 K 0.0000 K 0.0000 C14.47108229e−008 C1 2.82365956e−009 C1 6.25856212e−008 C2−4.00171489e−013 C2 −3.11781699e−013 C2 9.37857950e−013 C34.13032418e−018 C3 −1.69631649e−018 C3 3.67635940e−017 C46.29956500e−022 C4 1.14900242e−021 C4 8.35698619e−021 C5−3.85978221e−026 C5 −1.52629451e−025 C5 −1.33482892e−024 C62.31708241e−030 C6 8.81503206e−030 C6 1.38831758e−028 C7 0.00000000e+000C7 0.00000000e+000 C7 0.00000000e+000 C8 0.00000000e+000 C80.00000000e+000 C8 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000C9 0.00000000e+000 Surface No. 31 Surface No.. 33 Surface No. 41 K0.0000 K 0.0000 K 0.0000 C1 −6.25856212e−008 C1 −2.82365956e−009 C12.31765306e−008 C2 −9.37857950e−013 C2 3.11781699e−013 C2−1.15108202e−012 C3 −3.67635940e−017 C3 1.69631649e−018 C32.55992541e−017 C4 −8.35698619e−021 C4 −1.14900242e−021 C46.87393928e−022 C5 1.33482892e−024 C5 1.52629451e−025 C5−3.66676084e−026 C6 −1.38831758e−028 C6 −8.81503206e−030 C6−2.77895503e−030 C7 0.00000000e+000 C7 0.00000000e+000 C70.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000C9 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 Surface No. 42Surface No. 44 Surface No. 49 Surface No. 57 K 0.0000 K 0.0000 K 0.0000K 0.0000 C1 1.23211770e−007 C1 −1.18481725e−007 C1 2.68959500e−008 C13.32050996e−008 C2 −2.94099944e−012 C2 −2.04738790e−012 C2−9.41267411e−014 C2 4.58821096e−012 C3 1.13325221e−015 C3−5.33930585e−016 C3 2.54969437e−018 C3 −7.80384116e−016 C4−1.09316744e−019 C4 −1.51638014e−020 C4 −1.50502498e−022 C41.16466986e−019 C5 2.28727473e−024 C5 1.67227571e−024 C5 6.35633774e−027C5 −1.04436731e−023 C6 1.03306617e−027 C6 −4.91365155e−028 C6−9.71849339e−032 C6 4.66260861e−028 C7 0.00000000e+000 C70.00000000e+000 C7 0.00000000e+000 C7 0.00000000e+000 C8 0.00000000e+000C8 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C90.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000

TABLE 5 NAO = 0.27 Y = 56.08 mm WL 193.3685 193.368 193.3675 SiO221.56078491 1.5607857 1.56078649 Surface Radius Distance Material ½Diameter  0 0.000000000 40.000000000 AIR 56.080  1 700.00000000030.000000000 SIO2 70.401  2 −700.000000000 1.000000000 AIR 74.095  3700.000000000 30.000000000 SIO2 75.879  4 −700.000000000 −1.000000000AIR 77.689  5 500.000000000 30.000000000 SIO2 78.339  6 −1000.00000000015.000000000 AIR 78.060  7 700.000000000 30.000000000 SIO2 76.609  8−700.000000000 0.000000000 AIR 74.839  9 0.000000000 75.000000000 SIO274.070 10 0.000000000 75.000000000 SIO2 64.964 11 0.00000000013.000000000 AIR 55.857 12 −300.000000000 10.000000000 SIO2 54.317 13−500.000000000 5.000000000 AIR 53.682 14 0.000000000 10.000000000 AIR52.538 15 −290.000000000 0.000000000 AIR 55.162 16 0.00000000015.000000000 AIR 54.666 17 500.000000000 10.000000000 SIO2 56.801 18300.000000000 13.000000000 AIR 57.279 19 0.000000000 75.000000000 SIO258.589 20 0.000000000 75.000000000 SIO2 66.927 21 0.00000000030.000000000 AIR 75.266 22 300.000000000 30.000000000 SIO2 82.546 23−400.000000000 40.000100000 AIR 82.595 24 500.000000000 25.000000000SIO2 76.453 25 −400.000000000 41.206360088 AIR 74.915 26 0.0000000000.000000000 AIR 63.567

TABLE 9 SURFACE RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0.00000059.209510 64.0 1 6291.598274 23.678332 SILUV 1.560491 85.8 2 −280.6009021.025405 87.8 3 144.511042 32.290800 SILUV 1.560491 93.4 4 416.82192057.132926 91.4 5 163.242835 31.337729 SILUV 1.560491 78.6 6 −661.4782019.882827 75.2 7 85.805375 31.336035 SILUV 1.560491 59.0 8 97.84112432.157174 46.3 9 −110.558780 50.000185 SILUV 1.560491 43.4 10−105.568468 7.861299 62.9 11 −95.869843 33.360087 SILUV 1.560491 64.6 12−396.465160 25.208502 89.8 13 −295.388642 49.666565 SILUV 1.560491 103.314 −127.525234 0.999856 109.4 15 −279.794894 36.644817 SILUV 1.560491118.2 16 −160.830350 0.999370 121.6 17 321.280433 28.683439 SILUV1.560491 121.8 18 1713.098384 0.999141 120.6 19 249.641678 30.928964SILUV 1.560491 117.3 20 1775.118866 84.998661 114.7 21 0.000000−14.998086 REFL 183.2 22 −322.738827 −22.708716 SILUV 1.560491 86.5 231794.276655 −198.953288 84.1 24 102.167956 −12.500000 SILUV 1.56049172.4 25 15297.224085 −58.562725 82.5 26 106.167570 −12.500000 SILUV1.560491 89.2 27 192.760260 −27.399192 107.8 28 154.038668 27.399192REFL 115.3 29 192.760260 12.500000 SILUV 1.560491 107.8 30 106.16757058.562725 89.2 31 15297.224085 12.500000 SILUV 1.560491 82.5 32102.167956 198.954271 72.4 33 1794.276655 22.708716 SILUV 1.560491 84.134 −322.738827 14.999504 86.5 35 0.000000 −84.999766 REFL 179.0 36665.918045 −20.162556 SILUV 1.560491 112.6 37 332.340267 −0.999827 115.038 −545.416435 −30.156611 SILUV 1.560491 121.7 39 972.309758 −0.999891122.2 40 −239.092507 −40.367741 SILUV 1.560491 122.8 41 −3867.765964−1.000866 121.0 42 −145.814165 −43.782811 SILUV 1.560491 108.8 43−475.322286 −20.838629 103.7 44 994.251725 −9.999791 SILUV 1.560491100.7 45 −102.926902 −38.025955 82.3 46 −666.254624 −9.999917 SILUV1.560491 82.7 47 −120.991218 −38.125943 83.4 48 −444.529439 −19.995612SILUV 1.560491 93.9 49 7256.085975 −72.078976 96.0 50 861.320622−16.316029 SILUV 1.560491 115.4 51 367.114240 −21.532267 118.5 52−578.781634 −19.544116 SILUV 1.560491 135.3 53 −1539.844110 −1.000064136.2 54 −409.215581 −53.967605 SILUV 1.560491 140.1 55 388.259251−21.190519 140.0 56 0.000000 −14.363454 131.6 57 −492.744559 −42.747305SILUV 1.560491 135.3 58 596.175995 −0.999975 134.4 59 −188.727208−44.971247 SILUV 1.560491 119.1 60 −1267.900423 −0.999664 114.6 61−118.853763 −29.974419 SILUV 1.560491 90.5 62 −172.286110 −2.720285 82.263 −83.065857 −24.574193 SILUV 1.560491 67.0 64 −111.658319 −1.10509656.0 65 −69.828581 −43.055955 SILUV 1.560491 50.3 66 0.000000 −1.001571H2OV193 1.436823 20.5 67 0.000000 0.000000 19.0

TABLE 9A ASPHERIC CONSTANTS SRF 6 15 20 24 K 0 0 0 0 C1 7.168010E−08−6.564766E−09 1.990247E−08 −1.434139E−07 C2 7.874235E−13 4.352930E−132.214975E−13 −3.992456E−12 C3 3.026860E−16 −2.400883E−17 −2.046213E−17−3.265156E−16 C4 −3.434246E−20 3.866886E−22 9.725329E−22 3.104990E−21 C53.870353E−25 1.162444E−27 −2.756730E−26 −1.874174E−24 C6 7.234455E−29−1.259764E−32 4.143527E−31 −4.628892E−28 SRF 43 45 47 50 K 0 0 0 0 C1−1.007015E−08 −4.489903E−08 5.184442E−08 3.174451E−08 C2 −3.821558E−131.198606E−12 5.582183E−12 5.537615E−14 C3 8.872440E−17 −1.562441E−162.393671E−16 3.190712E−18 C4 −6.956619E−21 1.250805E−20 7.608169E−21−6.524213E−22 C5 3.866469E−25 2.467619E−24 −1.988373E−24 −7.379838E−27C6 −7.623750E−30 −1.675469E−28 2.670495E−28 −9.847764E−31 SRF 62 64 K 00 C1 6.908374E−08 −2.282295E−07 C2 −7.414546E−12 −2.062783E−11 C31.971662E−16 1.258799E−15 C4 −5.334580E−20 −2.146440E−19 C5 5.884223E−244.332875E−23 C6 −3.743875E−28 −1.189088E−27

TABLE 10 SURFACE RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0.00000051.000259 64.0 1 1084.670740 20.061470 SILUV 1.560491 84.0 2 −489.5915728.024505 85.7 3 147.977412 33.265720 SILUV 1.560491 93.2 4 533.60758860.035648 91.5 5 162.257926 31.487872 SILUV 1.560491 79.2 6 −641.54208712.321334 75.9 7 88.691635 37.381348 SILUV 1.560491 60.1 8 113.76796026.723349 45.6 9 −117.888976 42.501530 SILUV 1.560491 42.0 10−162.865349 13.700402 59.6 11 −116.482373 32.902705 SILUV 1.560491 63.112 −306.816392 26.438566 83.9 13 −323.530175 41.085951 SILUV 1.56049199.9 14 −137.244758 5.556612 105.5 15 −451.636628 44.589731 SILUV1.560491 115.9 16 −154.769207 0.999820 119.2 17 392.370175 25.008628SILUV 1.560491 118.0 18 3014.562689 0.999723 117.0 19 289.17759125.844242 SILUV 1.560491 114.3 20 925.962044 84.999670 112.1 21 0.000000−14.999476 REFL 175.2 22 −331.395343 −22.607980 SILUV 1.560491 89.7 233332.007318 −230.559976 87.1 24 98.691313 −12.500000 SILUV 1.560491 73.125 28881.747267 −55.643371 84.0 26 105.777999 −12.500000 SILUV 1.56049189.4 27 190.916612 −27.579443 109.5 28 155.323230 27.579443 REFL 118.229 190.916612 12.500000 SILUV 1.560491 109.5 30 105.777999 55.64337189.4 31 28881.747267 12.500000 SILUV 1.560491 84.0 32 98.691313230.560091 73.1 33 3332.007318 22.607980 SILUV 1.560491 87.1 34−331.395343 14.999815 89.7 35 0.000000 −85.031452 REFL 185.4 36632.234731 −21.937556 SILUV 1.560491 116.1 37 312.776852 −1.989523 118.638 −419.317799 −39.548184 SILUV 1.560491 126.0 39 679.933212 −11.879717126.0 40 −359.055554 −33.826228 SILUV 1.560491 122.0 41 1713.588185−6.930143 120.4 42 −130.793879 −40.665153 SILUV 1.560491 103.0 43−297.152405 −24.525611 97.5 44 888.942670 −10.000074 SILUV 1.560491 94.845 −95.853886 −38.822971 77.7 46 −1286.530610 −10.502279 SILUV 1.56049178.3 47 −122.332491 −53.312951 80.5 48 −1046.310490 −29.995767 SILUV1.560491 98.8 49 −3155.314818 −35.731529 106.3 50 −2635.516216−38.906996 SILUV 1.560491 121.6 51 253.216058 −1.026566 125.0 52−477.178385 −27.726167 SILUV 1.560491 136.5 53 −1111.410551 −1.006437137.0 54 −419.465047 −45.153215 SILUV 1.560491 138.9 55 657.652879−27.561809 138.4 56 0.000000 11.279146 129.1 57 −1714.364190 −34.463306SILUV 1.560491 133.1 58 435.051330 −26.422505 131.9 59 −217.425708−40.030383 SILUV 1.560491 113.2 60 191072.918549 −0.999778 109.6 61−106.841172 −32.593766 SILUV 1.560491 85.0 62 −202.323930 −0.999427 77.063 −79.299863 −25.891843 SILUV 1.560491 63.5 64 −117.061751 −0.99847652.9 65 −70.340516 −36.868819 SILUV 1.560491 46.7 66 0.000000 −1.001571H2OV193 1.436823 20.5 67 0.000000 0.000000 19.0

TABLE 10A ASPHERIC CONSTANTS SRF 6 15 23 24 32 K 0 0 0 0 0 C18.416890E−08 −2.308559E−08 −8.485003E−09 −1.223767E−07 −1.223767E−07 C21.006640E−12 1.109550E−13 −6.734945E−14 −7.438273E−12 −7.438273E−12 C33.617643E−16 −6.344353E−18 5.661979E−19 −4.704304E−16 −4.704304E−16 C4−4.192188E−20 1.566682E−22 −2.504587E−22 3.963572E−21 3.963572E−21 C56.704096E−26 −4.902118E−27 2.908669E−26 −6.736661E−24 −6.736661E−24 C61.721955E−28 4.306889E−32 −1.350234E−30 −4.531767E−28 −4.531767E−28 SRF33 43 45 47 50 K 0 0 0 0 0 C1 −8.485003E−09 −3.497951E−09 −4.202804E−086.218114E−08 3.138180E−08 C2 −6.734945E−14 −5.106017E−13 1.982600E−124.755456E−12 −3.924136E−13 C3 5.661979E−19 6.844726E−17 −1.463517E−164.467358E−16 5.657046E−18 C4 −2.504587E−22 −3.263478E−21 9.687863E−212.313332E−20 −6.552593E−22 C5 2.908669E−26 9.349870E−26 2.764278E−24−3.886568E−24 2.087202E−26 C6 −1.350234E−30 2.248476E−30 7.460803E−294.543438E−28 −5.207993E−31 SRF 55 62 64 K 0 0 0 C1 −5.022929E−10−2.500268E−08 −1.132630E−07 C2 −3.387071E−14 −7.360583E−12 −3.255025E−11C3 −1.887886E−17 1.175353E−15 6.754420E−15 C4 6.061750E−22 −2.566402E−19−9.778374E−19 C5 −8.730441E−27 2.406082E−23 6.403897E−23 C6 4.736715E−32−1.314800E−27 1.523975E−27

TABLE 11 SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0.00000042.716567 63.0 1 187.082284 29.074103 SIO2 1.560491 87.7 2 1122.62430013.704059 87.8 3 257.788495 25.970502 SIO2 1.560491 89.3 4 4087.9237196.751806 88.2 5 149.090802 9.999268 SIO2 1.560491 84.3 6 112.19084020.619019 79.4 7 222.671339 39.005001 SIO2 1.560491 79.4 8 −171.4868680.999098 77.9 9 72.242638 58.534093 SIO2 1.560491 61.0 10 103.26358523.657309 38.2 11 −120.537552 36.218695 SIO2 1.560491 39.7 12 −79.00969013.559024 52.6 13 −70.743286 10.000301 SIO2 1.560491 55.6 14 −406.87549315.578104 72.7 15 −167.014571 41.099022 SIO2 1.560491 76.7 16 −97.8819740.999302 86.2 17 −289.132352 49.908319 SIO2 1.560491 102.4 18−127.491717 0.999640 108.2 19 −915.187280 29.128849 SIO2 1.560491 114.220 −267.279137 70.000315 116.1 21 0.000000 −99.530888 REFL 163.4 22−211.224346 −59.634155 SIO2 1.560491 129.3 23 847.318306 −285.786240127.5 24 108.606993 −12.500000 SIO2 1.560491 68.7 25 −2037.814268−40.801930 77.3 26 98.650256 −12.500000 SIO2 1.560491 79.4 27 173.699507−12.863441 95.4 28 147.630649 12.863441 REFL 98.7 29 173.69950712.500000 SIO2 1.560491 95.4 30 98.650256 40.801930 79.4 31 −2037.81426812.500000 SIO2 1.560491 77.3 32 108.606993 285.786240 68.7 33 847.31830659.634155 SIO2 1.560491 127.5 34 −211.224346 81.116047 129.3 35 0.000000−73.612596 REFL 160.7 36 −389.330139 −33.487696 SIO2 1.560491 114.9 371028.934202 −0.999947 113.5 38 −174.265376 −32.363134 SIO2 1.560491104.3 39 −396.847027 −1.000532 99.8 40 −121.243745 −48.918207 SIO21.560491 89.3 41 −131.171270 −29.702617 71.3 42 335.952888 −10.034790SIO2 1.560491 69.3 43 −82.977553 −43.925742 61.4 44 142.301184 −9.999862SIO2 1.560491 63.2 45 −263.305242 −23.458962 74.7 46 2291.125201−61.398344 SIO2 1.560491 84.5 47 165.812687 −1.061241 103.9 48486.553030 −37.309271 SIO2 1.560491 113.9 49 194.984003 −21.455915 120.750 −2153.235102 −50.329924 SIO2 1.560491 142.6 51 291.296473 −0.999132144.8 52 −443.499291 −44.594835 SIO2 1.560491 146.7 53 1173.500711−8.577265 145.5 54 0.000000 7.578035 138.4 55 −337.532449 −35.808358SIO2 1.560491 139.1 56 −1836.960645 −1.165380 136.4 57 −439.395199−28.816834 SIO2 1.560491 133.5 58 2161.178835 −0.998190 130.3 59−260.497359 −36.004531 SIO2 1.560491 115.8 60 5382.003743 −0.997164110.1 61 −122.176927 −36.201583 SIO2 1.560491 86.2 62 −321.548352−1.000000 76.5 63 −54.686592 −41.835126 SIO2 1.560491 49.5 64 0.000000−3.000000 H2O 1.436823 25.2 65 0.000000 0.000000 18.8

TABLE 11A ASPHERIC CONSTANTS SRF 8 14 19 22 25 K 0 0 0 0 0 C11.079370E−07 7.669220E−08 −7.045424E−09 1.010508E−08 3.738770E−08 C21.064327E−12 −1.973038E−11 −3.066122E−14 1.795924E−13 −3.496492E−12 C3−4.566909E−16 2.138994E−15 −4.118337E−18 1.934995E−18 3.233016E−16 C41.905320E−19 −1.074179E−19 3.495758E−22 1.389960E−22 −3.498294E−20 C5−1.972022E−23 −2.090955E−24 −2.483792E−26 −5.289985E−27 2.704951E−24 C68.751032E−28 4.279927E−28 4.016359E−31 1.320749E−31 −9.856748E−29 SRF 3134 42 46 48 K 0 0 0 0 0 C1 3.738770E−08 1.010508E−08 3.117477E−088.249850E−08 4.142725E−08 C2 −3.496492E−12 1.795924E−13 −1.385143E−11−1.955317E−13 −2.012061E−12 C3 3.233016E−16 1.934995E−18 2.707311E−15−8.022466E−17 1.566310E−17 C4 −3.498294E−20 1.389960E−22 −3.351896E−19−1.723197E−20 1.046236E−22 C5 2.704951E−24 −5.289985E−27 2.318550E−23−8.777152E−25 3.404661E−25 C6 −9.856748E−29 1.320749E−31 −7.018917E−28−2.800720E−28 −8.280605E−30 SRF 51 57 60 K 0 0 0 C1 3.292883E−104.807681E−08 3.409977E−09 C2 −7.254285E−13 −2.265563E−12 −3.641765E−12C3 2.476488E−17 6.703492E−17 2.594792E−16 C4 −1.056859E−21 −1.704146E−21−1.764035E−20 C5 4.966804E−26 4.472968E−26 7.777614E−25 C6 −8.485797E−31−6.865707E−31 −1.797945E−29

TABLE 12 SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0.00000035.040681 61.5 1 210.405327 30.736588 SIO2 1.560491 81.0 2 −829.2141915.286654 81.6 3 107.948426 51.211605 SIO2 1.560491 82.3 4 81.56170024.185596 66.5 5 129.355284 38.167801 SIO2 1.560491 67.5 6 −166.8421640.997639 65.8 7 73.621253 52.812760 SIO2 1.560491 55.2 8 87.50232623.343983 35.4 9 −63.355137 18.274984 SIO2 1.560491 38.4 10 −64.79545615.650649 46.8 11 −65.436171 11.477841 SIO2 1.560491 52.6 12 −192.74455816.904355 69.7 13 −246.808133 48.828721 SIO2 1.560491 85.8 14−107.969356 0.997713 94.9 15 −447.790890 56.851474 SIO2 1.560491 111.116 −133.844748 0.997553 116.8 17 315.857486 38.321196 SIO2 1.560491120.8 18 −1923.797869 0.996321 119.7 19 232.932637 43.497172 SIO21.560491 114.0 20 −887.954229 59.994922 110.5 21 0.000000 −177.093526REFL 80.1 22 102.645236 −12.500000 SIO2 1.560491 67.0 23 942.361489−43.357484 77.8 24 90.416551 −12.500000 SIO2 1.560491 79.9 25 149.946360−13.736983 97.4 26 131.782255 13.736983 REFL 100.5 27 149.94636012.500000 SIO2 1.560491 97.4 28 90.416551 43.357484 79.9 29 942.36148912.500000 SIO2 1.560491 77.8 30 102.645236 177.093526 67.0 31 0.000000−60.055220 REFL 75.6 32 104914.890260 −35.073765 SIO2 1.560491 98.4 33219.963934 −0.997320 101.4 34 −485.974374 −33.321196 SIO2 1.560491 106.435 531.348627 −0.997416 106.7 36 −179.150861 −35.974078 SIO2 1.560491104.0 37 −726.299833 −0.997789 101.1 38 −143.133378 −31.466370 SIO21.560491 92.9 39 −333.246416 −43.619093 87.4 40 149.805913 −9.999074SIO2 1.560491 78.6 41 −96.090593 −42.639692 69.3 42 224.529027 −9.998160SIO2 1.560491 70.5 43 −264.668390 −13.559760 81.5 44 −938.629305−29.640517 SIO2 1.560491 87.3 45 304.621140 −22.447192 93.1 46−943.485170 −40.752283 SIO2 1.560491 115.1 47 271.215785 −2.888195 119.348 −456.833471 −43.199885 SIO2 1.560491 132.8 49 693.683615 −0.999609133.5 50 −281.164030 −30.395117 SIO2 1.560491 132.9 51 −613.816799−6.979889 131.4 52 0.000000 4.747264 128.8 53 −323.801518 −45.333595SIO2 1.560491 131.0 54 567.522747 −0.997957 129.5 55 −227.500831−39.940578 SIO2 1.560491 115.7 56 2013.736081 −0.994433 111.6 57−127.539619 −33.332450 SIO2 1.560491 88.1 58 −263.904129 −0.995386 79.459 −186.455700 −17.466462 SIO2 1.560491 75.0 60 −223.493619 −1.00000065.7 61 −50.654088 −43.114607 SIO2 1.560491 46.1 62 0.000000 −1.001571H2O 1.436823 20.2 63 0.000000 0.000000 18.4

TABLE 12A ASPHERIC CONSTANTS SRF 6 15 20 23 29 K 0 0 0 0 0 C11.415105E−07 −3.894450E−08 3.025563E−08 1.956249E−08 1.956249E−08 C22.826103E−11 2.477873E−13 −9.725078E−13 −1.254267E−12 −1.254267E−12 C3−2.796060E−15 −1.083388E−17 5.264859E−17 9.958049E−17 9.958049E−17 C4−2.054534E−20 −9.685453E−22 −2.790853E−21 −1.339908E−20 −1.339908E−20 C52.141589E−23 4.488758E−26 1.033038E−25 1.243181E−24 1.243181E−24 C62.934466E−27 −1.114090E−30 −1.853921E−30 −1.590289E−29 −1.590289E−29 SRF39 40 42 46 53 K 0 0 0 0 0 C1 −2.460699E−08 −1.818564E−07 9.053886E−082.136533E−08 3.430277E−08 C2 7.712743E−13 −5.379726E−12 −1.959930E−126.940713E−13 2.113104E−13 C3 −8.069808E−17 1.480406E−15 −3.377347E−17−1.785783E−17 −8.054096E−17 C4 −5.118403E−22 −1.519056E−19 3.600872E−20−1.433861E−21 3.084255E−21 C5 −4.277639E−25 1.009523E−23 −8.476096E−241.884530E−25 −3.491487E−26 C6 1.160028E−29 −4.043479E−28 3.114715E−28−8.828841E−30 5.775365E−32 SRF 55 58 K 0 0 C1 2.382259E−08 9.580994E−08C2 −8.346810E−13 −3.279417E−11 C3 1.015704E−16 5.067874E−15 C45.829694E−22 −5.784345E−19 C5 6.456340E−26 4.554897E−23 C6 −7.406922E−30−1.883439E−27

TABLE 13 SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0.00000035.000921 64.0 1 187.873268 27.994570 SIO2 1.560491 84.8 2 1232.2410840.999905 84.9 3 208.335351 22.691065 SIO2 1.560491 85.8 4 516.06246936.805573 84.3 5 144.085611 11.684135 SIO2 1.560491 79.4 6 104.20097618.908624 74.4 7 198.091293 38.252361 SIO2 1.560491 74.7 8 −192.8611162.099088 73.3 9 68.893595 56.883996 SIO2 1.560491 61.6 10 85.94871933.744342 40.9 11 −114.007614 22.821973 SIO2 1.560491 45.3 12 −76.2229679.221322 52.2 13 −67.210067 9.999789 SIO2 1.560491 53.7 14 −429.66387710.809503 70.6 15 −265.085106 43.979820 SIO2 1.560491 76.7 16−101.149234 0.999957 85.3 17 −188.336349 61.381983 SIO2 1.560491 94.4 18−125.228059 0.999649 108.4 19 −831.599269 31.650721 SIO2 1.560491 113.520 −227.778209 70.000634 115.5 21 0.000000 −10.976723 REFL 113.6 22−197.591390 −49.195844 SIO2 1.560491 114.4 23 1113.814097 −282.271651112.2 24 95.811897 −12.500000 SIO2 1.560491 68.9 25 1585.519591−38.490833 81.2 26 106.142717 −12.500000 SIO2 1.560491 83.5 27160.434031 −12.092178 98.0 28 144.603311 12.092178 REFL 101.8 29160.434031 12.500000 SIO2 1.560491 98.0 30 106.142717 38.490833 83.5 311585.519591 12.500000 SIO2 1.560491 81.2 32 95.811897 282.271651 68.9 331113.814097 49.195844 SIO2 1.560491 112.2 34 −197.591390 10.976723 114.435 0.000000 −70.000758 REFL 113.0 36 −227.942708 −45.666153 SIO21.560491 113.9 37 815.467694 −8.857490 111.9 38 −130.706498 −42.732270SIO2 1.560491 96.7 39 −422.473074 −3.774367 91.0 40 −347.973618−10.000122 SIO2 1.560491 87.2 41 −187.015492 −26.831797 79.4 42305.312838 −9.999427 SIO2 1.560491 77.7 43 −96.429310 −63.819408 67.9 44128.506823 −9.999684 SIO2 1.560491 71.4 45 −306.117569 −15.977415 85.146 4806.899558 −32.925545 SIO2 1.560491 89.1 47 230.072868 −16.32964696.4 48 1322.097164 −30.272168 SIO2 1.560491 111.8 49 252.570224−1.000013 117.3 50 −862.460198 −42.042752 SIO2 1.560491 133.4 51448.126973 −5.878180 135.8 52 −378.669699 −51.982596 SIO2 1.560491 142.653 730.087868 −26.644994 141.8 54 0.000000 0.211836 130.3 55 −454.237341−34.638587 SIO2 1.560491 132.4 56 896.710905 −0.999763 131.1 57−281.292658 −31.904925 SIO2 1.560491 122.1 58 −1508.491985 −0.999650118.8 59 −157.343378 −32.737319 SIO2 1.560491 105.3 60 −431.549831−0.998214 98.8 61 −227.748250 −34.282018 SIO2 1.560491 96.4 621679.133063 −1.000000 90.0 63 −57.914528 −47.987219 SIO2 1.560491 52.264 0.000000 −3.000000 H2O 1.436822 24.4 65 0.000000 0.000000 19.0

TABLE 13A ASPHERIC CONSTANTS SRF 8 19 22 25 31 K 0 0 0 0 0 C18.300393E−08 −1.573837E−08 1.023614E−08 2.221568E−08 2.221568E−08 C21.027628E−11 −1.239737E−13 1.645106E−13 −1.740421E−12 −1.740421E−12 C3−1.162954E−15 4.333229E−19 5.476658E−18 8.521877E−17 8.521877E−17 C42.985096E−19 4.074898E−23 5.702605E−23 −2.769929E−21 −2.769929E−21 C5−2.802134E−23 −1.053291E−26 9.144213E−28 −2.436823E−25 −2.436823E−25 C61.422951E−27 3.216727E−31 2.477447E−32 1.867891E−29 1.867891E−29 SRF 3437 39 42 48 K 0 0 0 0 0 C1 1.023614E−08 −2.156946E−08 2.940607E−08−4.027138E−08 3.236874E−08 C2 1.645106E−13 7.245612E−13 −3.554065E−12−8.699926E−12 −3.262283E−13 C3 5.476658E−18 −3.214615E−17 2.494890E−161.342629E−15 2.281353E−17 C4 5.702605E−23 1.250838E−21 −1.750741E−20−1.587155E−19 2.583318E−22 C5 9.144213E−28 −3.654841E−26 8.304704E−251.051342E−23 −8.007782E−27 C6 2.477447E−32 5.939707E−31 −4.233041E−29−3.667649E−28 2.555841E−30 SRF 55 57 60 K 0 0 0 C1 2.858710E−08−6.660513E−09 −8.504243E−08 C2 −4.529671E−13 1.798520E−13 9.820443E−13C3 −2.789924E−17 8.149876E−17 −5.540310E−17 C4 2.259110E−21−5.213396E−22 1.576819E−20 C5 −7.538599E−26 −1.301705E−27 −9.640368E−25C6 9.633331E−31 −5.575917E−31 1.171801E−29

TABLE 15 SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0.00000035.638328 64.5 1 180.670546 28.377083 SIO2 1.560491 86.9 2 823.5980181.194225 86.9 3 205.952639 21.462318 SIO2 1.560491 87.9 4 398.18683832.742116 86.4 5 132.286925 9.999671 SIO2 1.560491 82.8 6 105.11810022.332626 78.4 7 169.334381 39.894990 SIO2 1.560491 78.9 8 −204.6345150.998375 77.3 9 71.137197 56.763393 SIO2 1.560491 63.5 10 89.02858528.411826 42.3 11 −109.689407 29.990063 SIO2 1.560491 42.5 12 −79.24454311.316478 52.9 13 −69.719014 9.999481 SIO2 1.560491 55.1 14 −486.0864688.908815 72.6 15 −280.858669 63.675056 SIO2 1.560491 77.0 16 −111.7524760.999172 95.1 17 −263.723959 47.422516 SIO2 1.560491 107.8 18−134.607968 0.998507 113.2 19 −648.995845 28.867753 SIO2 1.560491 116.320 −239.623615 69.998695 118.1 21 0.000000 −9.999382 REFL 115.6 22−176.982011 −52.138664 SIO2 1.560491 117.7 23 2325.743514 −250.507300115.3 24 98.260574 −12.500000 SIO2 1.560491 68.0 25 8846.828964−46.770944 78.6 26 91.149491 −12.500000 SIO2 1.560491 80.6 27 149.955261−18.614447 98.7 28 143.121066 18.614447 REFL 106.4 29 149.95526112.500000 SIO2 1.560491 98.7 30 91.149491 46.770944 80.6 31 8846.82896412.500000 SIO2 1.560491 78.6 32 98.260574 250.507300 68.0 33 2325.74351452.138664 SIO2 1.560491 115.3 34 −176.982011 9.999382 117.7 35 0.000000−69.999093 REFL 117.4 36 −198.540813 −50.399536 SIO2 1.560491 120.7 37−96842.830748 −0.998438 118.2 38 −171.973861 −30.749387 SIO2 1.560491106.4 39 −310.515975 −0.999047 100.9 40 −148.789628 −29.674304 SIO21.560491 92.9 41 −216.223375 −29.457017 83.9 42 244.105965 −9.998957SIO2 1.560491 81.6 43 −94.244903 −51.985700 68.7 44 177.704589 −9.999140SIO2 1.560491 70.5 45 −255.547186 −23.809565 80.1 46 1016.476754−31.174795 SIO2 1.560491 85.3 47 185.094367 −0.999190 93.0 481691.382932 −25.547970 SIO2 1.560491 105.3 49 356.397350 −45.184652109.5 50 −673.758971 −45.536220 SIO2 1.560491 137.5 51 386.080342−0.998330 139.3 52 −725.704793 −34.052538 SIO2 1.560491 143.2 531177.576128 −20.729220 143.2 54 0.000000 19.731628 138.3 55 −296.953200−49.211938 SIO2 1.560491 142.1 56 755.844934 −0.996608 140.3 57−413.530408 −40.022653 SIO2 1.560491 135.6 58 728.550434 −0.994509 133.159 −253.678570 −33.049432 SIO2 1.560491 114.4 60 −3840.733691 −0.992017108.6 61 −147.857222 −36.663873 SIO2 1.560491 91.0 62 −727.362791−1.000000 82.4 63 −54.588882 −41.518373 SIO2 1.560491 49.4 64 0.000000−3.000000 H2O 1.436822 25.6 65 0.000000 0.000000 19.1

TABLE 15A ASPHERIC CONSTANTS SRF 8 19 22 25 31 K 0 0 0 0 0 C11.080775E−07 −1.359371E−08 1.195268E−08 1.894952E−08 1.894952E−08 C24.576422E−12 −1.179706E−13 3.137653E−13 −2.377925E−12 −2.377925E−12 C3−8.540180E−16 −1.702891E−18 4.990292E−18 2.890682E−16 2.890682E−16 C42.711292E−19 8.483261E−23 5.081387E−22 −5.626586E−20 −5.626586E−20 C5−3.150111E−23 −9.645405E−27 −1.599365E−26 6.907483E−24 6.907483E−24 C61.652368E−27 2.669817E−31 6.313609E−31 −3.643846E−28 −3.643846E−28 SRF34 42 46 48 51 K 0 0 0 0 0 C1 1.195268E−08 −5.071114E−08 2.526230E−081.948430E−08 −7.924272E−09 C2 3.137653E−13 −7.730551E−12 5.333528E−12−3.427570E−12 −2.800312E−13 C3 4.990292E−18 1.390231E−15 −2.388835E−168.808674E−17 −1.107739E−18 C4 5.081387E−22 −1.451491E−19 1.259420E−20−8.959654E−22 −6.249802E−22 C5 −1.599365E−26 9.288570E−24 −1.438626E−248.169992E−25 3.539057E−26 C6 6.313609E−31 −2.767389E−28 4.673358E−29−4.150555E−29 −3.955788E−31 SRF 56 57 60 K 0 0 0 C1 −5.185154E−082.760546E−08 2.284067E−09 C2 1.533838E−12 −1.425919E−12 −5.023236E−12 C3−3.899899E−17 4.438919E−17 4.371011E−16 C4 2.974803E−21 1.556484E−21−3.186523E−20 C5 −1.127749E−25 −7.877661E−26 1.530451E−24 C61.290864E−30 3.875637E−31 −3.713691E−29

TABLE 16 SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0.00000035.000018 61.5 1 176.014829 27.505489 SIO2 1.560491 83.2 2 841.6413383.539440 83.3 3 235.708002 18.995896 SIO2 1.560491 84.2 4 435.38610831.751453 83.2 5 145.827863 9.997737 SIO2 1.560491 81.5 6 108.75627621.241416 77.5 7 172.246858 43.116768 SIO2 1.560491 78.7 8 −170.8351131.011739 77.5 9 69.519772 62.982649 SIO2 1.560491 62.1 10 79.35751224.125307 37.1 11 −105.554185 28.151777 SIO2 1.560491 40.1 12 −75.4324918.970185 50.0 13 −65.960377 9.998436 SIO2 1.560491 51.6 14 −458.37841615.879266 68.1 15 −182.010566 40.279435 SIO2 1.560491 74.6 16 −98.6196830.998823 84.4 17 −298.466841 53.135226 SIO2 1.560491 100.4 18−121.383228 0.999120 106.3 19 −835.480319 32.135277 SIO2 1.560491 109.920 −214.880198 81.470423 111.6 21 0.000000 −104.650759 REFL 105.0 22−181.003736 −50.001353 SIO2 1.560491 108.2 23 25242.924145 −247.127318104.9 24 102.272953 −12.500000 SIO2 1.560491 70.6 25 2103.060508−45.023548 79.1 26 93.409938 −12.500000 SIO2 1.560491 81.3 27 183.538848−17.774476 102.5 28 145.905578 17.774476 REFL 106.5 29 183.53884812.500000 SIO2 1.560491 102.5 30 93.409938 45.023548 81.3 31 2103.06050812.500000 SIO2 1.560491 79.1 32 102.272953 247.127318 70.6 3325242.924145 50.001353 SIO2 1.560491 104.9 34 −181.003736 104.650759108.2 35 0.000000 −69.997840 REFL 105.8 36 −274.353554 −38.229015 SIO21.560491 110.1 37 1131.690506 −0.997876 108.9 38 −183.833011 −33.580596SIO2 1.560491 101.6 39 −632.386130 −3.643030 97.6 40 −138.532192−34.568737 SIO2 1.560491 86.8 41 −189.656554 −26.890307 75.9 42255.989593 −9.998587 SIO2 1.560491 73.9 43 −92.462677 −50.122191 64.9 44175.417954 −9.998324 SIO2 1.560491 68.1 45 −239.557458 −20.895117 78.346 893.327075 −36.743354 SIO2 1.560491 83.5 47 180.351521 −1.580032 92.348 1793.077203 −23.224027 SIO2 1.560491 102.7 49 346.025735 −46.740042107.1 50 −587.720308 −49.840882 SIO2 1.560491 138.2 51 362.715565−0.996413 139.9 52 −802.776800 −32.541316 SIO2 1.560491 143.2 531200.879163 −20.610535 143.1 54 0.000000 19.614848 138.0 55 −277.707719−52.291236 SIO2 1.560491 141.8 56 708.666176 −0.995494 139.7 57−424.462858 −35.408449 SIO2 1.560491 134.6 58 920.517618 −0.994818 131.959 −257.650413 −33.302544 SIO2 1.560491 115.0 60 −3892.659133 −0.993481109.3 61 −150.518437 −37.001664 SIO2 1.560491 91.7 62 −815.328045−1.000000 83.2 63 −54.709895 −42.146539 SIO2 1.560491 49.5 64 0.000000−3.000000 H2O 1.436822 24.8 65 0.000000 0.000000 18.4

TABLE 16A ASPHERIC CONSTANTS SRF 8 19 22 25 31 K 0 0 0 0 0 C19.477707E−08 −1.630325E−08 8.446555E−09 3.545371E−09 3.545371E−09 C21.961231E−12 −9.812446E−14 2.275492E−13 −6.774437E−13 −6.774437E−13 C3−4.595943E−16 −1.945238E−18 −8.360514E−19 4.237596E−17 4.237596E−17 C42.712352E−19 2.190264E−22 1.164424E−21 −5.726376E−21 −5.726376E−21 C5−3.717129E−23 −2.392299E−26 −6.873389E−26 1.719638E−25 1.719638E−25 C62.062145E−27 8.993812E−31 2.030241E−30 1.264086E−29 1.264086E−29 SRF 3442 46 48 51 K 0 0 0 0 0 C1 8.446555E−09 −3.731377E−08 −7.541203E−093.402805E−08 −7.582220E−09 C2 2.275492E−13 −5.506103E−12 3.280912E−12−2.111476E−12 −1.607342E−13 C3 −8.360514E−19 1.183283E−15 −1.338960E−163.392400E−17 −9.929315E−18 C4 1.164424E−21 −1.705010E−19 −2.204551E−20−3.518123E−21 −4.709955E−22 C5 −6.873389E−26 1.532771E−23 5.087511E−261.006578E−24 4.064977E−26 C6 2.030241E−30 −6.241836E−28 −4.751065E−28−2.276157E−29 −5.868799E−31 SRF 56 57 60 K 0 0 0 C1 −5.466505E−083.173474E−08 4.604026E−09 C2 1.620583E−12 −1.360966E−12 −4.261817E−12 C3−3.331287E−17 4.744992E−17 3.289463E−16 C4 2.561164E−21 9.163771E−22−2.280425E−20 C5 −1.070898E−25 −7.066436E−26 9.960289E−25 C61.395421E−30 7.159877E−31 −2.271390E−29

TABLE 17 SURF RADIUS THICKNESS MATERIAL INDEX SEMIDIAM. 0 0.00000035.062171 61.5 1 160.377892 33.915692 SIO2 1.560491 85.2 2 4339.54582035.211752 85.0 3 134.501543 9.996831 SIO2 1.560491 83.7 4 111.69217624.343835 80.0 5 176.022408 44.412851 SIO2 1.560491 81.0 6 −158.1257661.097941 79.5 7 70.127955 63.281412 SIO2 1.560491 62.6 8 80.89902423.149420 37.4 9 −104.439732 28.493683 SIO2 1.560491 39.7 10 −76.6915449.373106 50.2 11 −66.201313 9.999364 SIO2 1.560491 51.9 12 −449.32145612.356383 69.1 13 −193.830863 41.850652 SIO2 1.560491 73.7 14 −96.8082400.997395 83.6 15 −309.193570 53.879882 SIO2 1.560491 100.4 16−121.506051 0.996721 106.4 17 −1347.934891 32.667851 SIO2 1.560491 110.718 −232.958167 69.997839 112.2 19 0.000000 −95.009945 REFL 106.8 20−169.601782 −49.964697 SIO2 1.560491 108.4 21 −2559.597028 −244.909101104.7 22 94.645450 −12.500000 SIO2 1.560491 70.0 23 2366.726589−50.185589 83.9 24 96.645650 −12.500000 SIO2 1.560491 86.5 25 158.153978−11.143815 106.9 26 150.128583 11.143815 REFL 111.0 27 158.15397812.500000 SIO2 1.560491 106.9 28 96.645650 50.185589 86.5 29 2366.72658912.500000 SIO2 1.560491 83.9 30 94.645450 244.909101 70.0 31−2559.597028 49.964697 SIO2 1.560491 104.7 32 −169.601782 95.009945108.4 33 0.000000 −69.996314 REFL 106.9 34 −281.792007 −41.385881 SIO21.560491 110.8 35 657.889902 −0.997396 109.7 36 −174.312217 −32.438650SIO2 1.560491 100.1 37 −476.477690 −1.935634 95.7 38 −123.498799−34.625674 SIO2 1.560491 85.0 39 −152.214034 −29.454227 73.4 40230.398053 −9.988522 SIO2 1.560491 71.5 41 −84.263230 −42.301978 62.8 42148.358426 −9.995751 SIO2 1.560491 64.2 43 −285.965468 −29.500257 76.244 1365.214672 −52.201213 SIO2 1.560491 91.3 45 197.964169 −1.405485110.1 46 471.452295 −43.072393 SIO2 1.560491 120.4 47 209.873148−1.120291 130.5 48 −1186.156898 −60.630783 SIO2 1.560491 155.2 49325.015642 −0.999174 157.9 50 −2211.880008 −27.251892 SIO2 1.560491162.5 51 1353.381133 −0.997683 163.0 52 −333.578758 −60.245043 SIO21.560491 162.7 53 664.853013 −3.960500 160.4 54 0.000000 2.974292 153.255 −436.081909 −40.203050 SIO2 1.560491 152.1 56 1058.418471 −0.974875149.3 57 −242.988440 −46.663567 SIO2 1.560491 127.0 58 1737.489827−0.944194 120.7 59 −113.935104 −37.162408 SIO2 1.560491 86.5 60−237.094762 −1.000000 75.1 61 −53.008742 −37.444181 SIO2 1.560491 48.162 0.000000 −3.000000 H2O 1.436823 26.7 63 0.000000 0.000000 18.4

TABLE 17A ASPHERIC CONSTANTS SRF 6 17 20 23 29 K 0 0 0 0 0 C11.567356E−07 −1.504554E−08 1.102741E−08 1.329977E−08 1.329977E−08 C2−1.454311E−12 −1.033827E−13 3.161475E−13 −6.446967E−13 −6.446967E−13 C3−4.821299E−16 −5.875858E−18 −3.234527E−18 2.574587E−17 2.574587E−17 C43.177351E−19 7.367131E−22 1.863348E−21 2.145483E−21 2.145483E−21 C5−4.247779E−23 −5.690740E−26 −1.058278E−25 −6.859442E−25 −6.859442E−25 C62.417313E−27 1.690737E−30 3.288177E−30 4.363205E−29 4.363205E−29 SRF 3240 44 46 49 K 0 0 0 0 0 C1 1.102741E−08 −7.623733E−08 5.961950E−084.163425E−08 1.556511E−08 C2 3.161475E−13 −2.696128E−12 2.260719E−12−2.205874E−12 −9.513867E−13 C3 −3.234527E−18 1.720996E−15 1.675440E−17−2.145810E−18 1.334037E−17 C4 1.863348E−21 −3.583626E−19 9.620913E−21−9.265446E−21 −6.577842E−22 C5 −1.058278E−25 3.893269E−23 −4.439958E−241.471307E−24 4.785308E−26 C6 3.288177E−30 −1.781650E−27 −3.165933E−29−4.599952E−29 −1.010940E−30 SRF 53 55 58 K 0 0 0 C1 −4.190276E−083.093715E−08 6.193974E−09 C2 1.643663E−12 −1.212659E−12 −3.507726E−12 C3−4.727323E−17 4.234860E−17 2.841523E−16 C4 7.314393E−22 −1.652445E−21−1.871154E−20 C5 7.386195E−27 5.642952E−26 7.577332E−25 C6 −2.389707E−31−7.153949E−31 −1.502450E−29

TABLE 18 Tab. D_(max) D_(M) D_(M)/D_(max) Y′ NA N_(L) N_(OP) COMP1 COMP2COMP3 1 256.8 235.2 0.92 14.4 1.2 23 3 12.4 284.5 94.8 3 252.9 243.30.96 14.4 1.1 25 3 14.5 362.4 120.8 9 270.6 230.6 0.85 16.0 1.2 28 311.7 328.9 109.6 10 277.8 236.4 0.85 16.0 1.2 28 3 12.1 337.6 112.5 11293.4 197.4 0.67 16.0 1.3 27 3 10.9 293.0 97.7 12 267.0 201.0 0.75 16.01.25 27 3 10.7 288.4 96.1 13 285.2 203.6 0.71 16.0 1.25 27 3 11.4 308.0102.7 15 286.4 212.8 0.74 16.1 1.3 27 3 10.5 283.8 94.6 16 286.4 213.00.74 15.4 1.3 27 3 11.0 297.6 99.2 17 326.0 222.0 0.68 15.4 1.35 26 311.6 302.5 100.8

What is claimed is:
 1. A catadioptric projection objective for imaging apattern, which is arranged on an object plane of the projectionobjective, to an image plane of the projection objective when thepattern is illuminated with ultraviolet light, the projection objectivecomprising: a first objective part for imaging the pattern to a firstintermediate image, wherein all of the elements in the first objectivepart having optical power to image the pattern from the object plane tothe first intermediate image are refractive elements, a second objectivepart for imaging the first intermediate image to a second intermediateimage, wherein the second objective part comprises a single concavemirror, a third objective part for imaging the second intermediate imageto the image plane, and a first folding mirror for deflecting the lighttoward the concave mirror and a second folding mirror for deflecting thelight from the concave mirror to a first lens group in the thirdobjective part having a positive power, wherein the third objective partcomprises the first lens group having the positive refractive power, asecond lens group, which immediately follows the first lens group andhas a negative refractive power, a third lens group which immediatelyfollows the second lens group and has a positive refractive power, afourth lens group which immediately follows the third lens group and hasa positive refractive power, and an aperture stop which is arranged in atransitional region from the third lens group to the fourth lens group,wherein the fourth lens group comprises fewer than five lenses, andwherein the projection objective has an image-side numerical aperture NAof at least 1.2 when water is used as an immersion fluid between thethird objective part and the image plane.
 2. The projection objective ofclaim 1, wherein all of the lenses in the fourth lens group are positivelenses.
 3. The projection objective of claim 2, wherein the fourth lensgroup comprises four positive lenses.
 4. The projection objective ofclaim 1, wherein the second lens group comprises two negative lenses. 5.The projection objective of claim 4, wherein the two negative lenses areadjacent one another.
 6. The projection objective of claim 4, whereinthe two negative lenses each have a concave surface facing the imageplane.
 7. The projection objective of claim 4, wherein at least one ofthe two negative lenses is a biconcave lens.
 8. The projection objectiveof claim 1, wherein all of the elements in the third objective parthaving optical power to image the pattern from second intermediate imageto the image plane are refractive elements.
 9. The projection objectiveof claim 1, wherein the projection objective is configured for use at193 nm.
 10. The projection objective of claim 9, wherein the projectionobjective has an image-side numerical aperture NA of at least 1.3 at 193nm when water is used as an immersion fluid between the third objectivepart and the image plane.
 11. The projection objective of claim 1,wherein all of the lenses in the projection objective comprise silicondioxide.
 12. The catadioptric projection objective of claim 1, whereinthe single concave mirror is arranged in a region of a pupil plane. 13.The catadioptric projection objective of claim 1, wherein the first andthird objective parts have parallel optical axes and wherein the secondobjective part has an optical axis at a non-zero angle to the paralleloptical axes.
 14. The catadioptric projection objective of claim 1,wherein the second objective part further comprises at least onenegative lens.
 15. The catadioptric projection objective of claim 14,wherein the second objective part further comprises at least onepositive lens, and wherein the at least one negative lens is between theat least one positive lens and the concave mirror.
 16. The catadioptricprojection objective of claim 1, wherein the first objective part isconfigured to form the first intermediate image optically between thefirst folding mirror and the single concave mirror, and wherein thesecond objective part is configured to form the second intermediateimage optically between the single concave mirror and the second foldingmirror.
 17. The catadioptric projection objective of claim 1, whereinthe first objective part is configured to form the first intermediateimage optically between the object plane and the first folding mirror,and wherein the second objective part is configured to form the secondintermediate image optically between second folding mirror and the firstlens group in the third objective part.
 18. The catadioptric projectionobjective of claim 1, wherein the first and second folding mirrors aredifferent faces of a common prism.
 19. The catadioptric projectionobjective of claim 1, wherein the first and third objective parts sharea common optical axis and wherein the second objective part has anoptical axis at a non-zero angle to the common optical axes.
 20. Acatadioptric projection exposure system for microlithography comprisingan illumination system and the projection objective as claimed inclaim
 1. 21. A catadioptric projection objective for imaging a pattern,which is arranged on an object plane of the projection objective, to animage plane of the projection objective when the pattern is illuminatedwith ultraviolet light, the projection objective comprising: a firstobjective part for imaging the pattern to a first intermediate image,wherein all of the elements in the first objective part having opticalpower to image the pattern from the object plane to the firstintermediate image are refractive elements, a second objective part forimaging the first intermediate image to a second intermediate image,wherein the second objective part comprises a single concave mirror, athird objective part for imaging the second intermediate image to theimage plane, and a first folding mirror for deflecting the light towardthe concave mirror and a second folding mirror for deflecting the lightfrom the concave mirror to a first lens group in the third objectivepart having a positive refractive power, wherein the third objectivepart comprises the first lens group having the positive refractivepower, a second lens group, which immediately follows the first lensgroup and has a negative refractive power, a third lens group whichimmediately follows the second lens group and has a positive refractivepower, a fourth lens group which immediately follows the third lensgroup and has a positive refractive power, and an aperture stop which isarranged in a transitional region from the third lens group to thefourth lens group, wherein the second lens group comprises two negativelenses, wherein the fourth lens group comprises fewer than five lensesand wherein all of the lenses in the fourth lens group are positive, andwherein the projection objective is configured for use at 193 nm has animage-side numerical aperture NA of at least 1.3 when water is used asan immersion fluid between the third objective part and the image plane.22. The catadioptric projection objective of claim 21, wherein thefourth lens group comprises four positive lenses.
 23. The projectionobjective of claim 21, wherein the two negative lenses each have aconcave surface facing the image plane.
 24. The projection objective ofclaim 21, wherein the two negative lenses are adjacent one another. 25.A catadioptric projection exposure system for microlithographycomprising an illumination system and the projection objective asclaimed in claim
 21. 26. A catadioptric projection objective for imaginga pattern, which is arranged on an object plane of the projectionobjective, to an image plane of the projection objective when thepattern is illuminated with ultraviolet light, the projection objectivecomprising: a first objective part for imaging the pattern to a firstintermediate image, wherein all of the elements in the first objectivepart having optical power to image the pattern from the object plane tothe first intermediate image are refractive elements, a second objectivepart for imaging the first intermediate image to a second intermediateimage, wherein the second objective part comprises a single concavemirror, a third objective part for imaging the second intermediate imageto the image plane, and a first folding mirror for deflecting the lighttoward the concave mirror and a second folding mirror for deflecting thelight from the concave mirror to a first lens group in the thirdobjective part having a positive refractive power, wherein the thirdobjective part comprises the first lens group having the positiverefractive power, a second lens group, which immediately follows thefirst lens group and has a negative refractive power, a third lens groupwhich immediately follows the second lens group and has a positiverefractive power, a fourth lens group which immediately follows thethird lens group and has a positive refractive power, and an aperturestop which is arranged in a transitional region from the third lensgroup to the fourth lens group, wherein the second lens group comprisestwo negative lenses each having a concave surface facing the imageplane, and wherein the projection objective is configured for use at 193nm has an image-side numerical aperture NA of at least 1.3 when water isused as an immersion fluid between the third objective part and theimage plane.
 27. The catadioptric projection objective of claim 26,wherein the two negative lenses are adjacent one another.
 28. Theprojection objective of claim 27, wherein at least one of the negativelenses is a biconcave lens.
 29. The projection objective of claim 26,wherein at least one of the negative lenses is a biconcave lens.
 30. Acatadioptric projection exposure system for microlithography comprisingan illumination system and the projection objective as claimed in claim26.